Abstract
This paper describes a double pass surface encoder, composed of a 2D sinusoidal grid and an optical sensor, for nanometer position measurement in the XY plane. By using a double pass optical layout, the sensitivity becomes twice as much as that of the single pass encoder. From a wave optics simulation, the grid amplitude of 70 nm is selected. The experimental result shows that the sensor has a resolution higher than 5 nm. The interpolation error is 0.6 μm in both the X- and 7-direction. The extrapolation errors in the X- and Y-direction are 0.18 μm and 0.23 μm.
| Original language | English |
|---|---|
| Pages (from-to) | 80-99 |
| Number of pages | 20 |
| Journal | International Journal of Surface Science and Engineering |
| Volume | 1 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2007 |
Keywords
- double pass
- measurement
- micro-structured surface
- position measurement
- sensor
- sinusoidal grid
- surface encoder
- surface stage