TY - JOUR
T1 - A microtranslation table with scratch-drive actuators fabricated from silicon-on-insulator wafer
AU - Kanamori, Y.
AU - Yahagi, H.
AU - Hane, K.
N1 - Funding Information:
A part of this work was performed at Venture Business Laboratory in Tohoku University. Y. Kanamori received the MS and doctorate degree in engineering from Tohoku University in 1998 and in 2001, respectively. From 1998 to 2001, he was a Research Fellow of the Japan Society for the Promotion of Science. Since 2001, he has been a Research Associate of Graduate School of Engineering, Tohoku University. From 2003 to 2004, he was a postdoctoral researcher of Laboratory for Photonics and Nanostructures (LPN/CNRS) in France. He is currently engaged in the research and development of optical micro-sensors and optical MEMS. H. Yahagi received ME degree from Tohoku University in 2004. He is now belonging to Kyocera Corporation. K. Hane received the MS and doctorate degree in engineering from Nagoya University in 1980 and in 1983, respectively. From 1983 to 1994, he worked as a member of Department of Electrical Engineering in Nagoya University. From 1985 to 1986, he was a visiting researcher of National Research Council of Canada. Since 1994, he has been a Professor of Graduate School of Engineering, Tohoku University, and is currently engaged in the research and development of optical micro-sensors and optical MEMS.
PY - 2006/1/10
Y1 - 2006/1/10
N2 - From a silicon-on-insulator (SOI) wafer, a microtranslation table with scratch-drive actuator (SDA) has been fabricated. The device Si layer of SOI wafer is etched to form the plate of SDA, which is partially connected to the handle Si substrate by the SiO 2 layer. Dicing the handle Si substrate, a microtranslation table with the SDA array has been fabricated. Placing the microtranslation table upside down on the other Si substrate on which a thin conductive film is patterned for the electrical connection, the microtranslation table is moved by the SDA without carrying a metal wire. The moving velocity of 45.5 μm/s has been obtained by applying the voltage of 120 V at the operating frequency of 500 Hz.
AB - From a silicon-on-insulator (SOI) wafer, a microtranslation table with scratch-drive actuator (SDA) has been fabricated. The device Si layer of SOI wafer is etched to form the plate of SDA, which is partially connected to the handle Si substrate by the SiO 2 layer. Dicing the handle Si substrate, a microtranslation table with the SDA array has been fabricated. Placing the microtranslation table upside down on the other Si substrate on which a thin conductive film is patterned for the electrical connection, the microtranslation table is moved by the SDA without carrying a metal wire. The moving velocity of 45.5 μm/s has been obtained by applying the voltage of 120 V at the operating frequency of 500 Hz.
KW - MEMS
KW - Microtranslation table
KW - Scratch-drive actuator
KW - Silicon-on-insulator
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U2 - 10.1016/j.sna.2005.06.017
DO - 10.1016/j.sna.2005.06.017
M3 - Article
AN - SCOPUS:29144456694
SN - 0924-4247
VL - 125
SP - 451
EP - 457
JO - Sensors and Actuators A: Physical
JF - Sensors and Actuators A: Physical
IS - 2
ER -