A Monte Carlo simulation on the process of cluster deposition

K. Hongo, H. Mizuseki, Y. Kawazoe

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


Cluster deposition process is expected to open a new scheme for thin-film formation process, which realizes better physico-chemical properties than by conventional processes. We simulate the variants of morphologies of thin films fabricated by the cluster deposition, since it is important to investigate the properties of the thin film. In this paper, a Monte Carlo method is applied to describe the motion of clusters and monomers. The present numerical simulation is performed on a three-dimensional lattice. Some growth morphologies are obtained, and the relationship between the resultant morphologies and the parameters used in the simulation such as deposition rate and size of the clusters are examined.

Original languageEnglish
Pages (from-to)439-442
Number of pages4
JournalMaterials Transactions
Issue number3
Publication statusPublished - 2001


  • Cluster deposition
  • Computer simulation
  • Monte Carlo method
  • Segregation
  • Thin film


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