A new fabrication technology of FinFETs using a neutral beam etching

Kazuhikp Endo; Shuichi Noda; Takuya Ozaki; Seiji Samukawa; Meishoku Masahata; Yongxun Liu; Kenichi Ishii; Hidenori Takashima; Etsuro Sugimata; Takashi Matsukawa; Yuki Yamauchi; Yuki Ishikawa; Eiichi Suzuki

A new fabrication technology of FinFETs using a neutral beam etching

Kazuhikp Endo, Shuichi Noda, Takuya Ozaki, Seiji Samukawa, Meishoku Masahata, Yongxun Liu, Kenichi Ishii, Hidenori Takashima, Etsuro Sugimata, Takashi Matsukawa, Yuki Yamauchi, Yuki Ishikawa, Eiichi Suzuki

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Rectangular Si-Fin channel and Si-FinFETs were successfully fabricated to take advantage of the low-energy and damage-free characteristic of the newly proposed neutral beam etching system.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2005
Subtitle of host publication	2005 International Microprocesses and Nanotechnology Conference
Pages	228-229
Number of pages	2
Publication status	Published - 2005
Event	2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan Duration: 2005 Oct 25 → 2005 Oct 28

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference
Volume	2005

Other

Other	2005 International Microprocesses and Nanotechnology Conference
Country/Territory	Japan
City	Tokyo
Period	05/10/25 → 05/10/28

ASJC Scopus subject areas

Engineering(all)

Cite this

Endo, K., Noda, S., Ozaki, T., Samukawa, S., Masahata, M., Liu, Y., Ishii, K., Takashima, H., Sugimata, E., Matsukawa, T., Yamauchi, Y., Ishikawa, Y., & Suzuki, E. (2005). A new fabrication technology of FinFETs using a neutral beam etching. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference (pp. 228-229). [1595297] (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005).

A new fabrication technology of FinFETs using a neutral beam etching. / Endo, Kazuhikp; Noda, Shuichi; Ozaki, Takuya et al.
Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. 2005. p. 228-229 1595297 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Endo, K, Noda, S, Ozaki, T, Samukawa, S, Masahata, M, Liu, Y, Ishii, K, Takashima, H, Sugimata, E, Matsukawa, T, Yamauchi, Y, Ishikawa, Y & Suzuki, E 2005, A new fabrication technology of FinFETs using a neutral beam etching. in Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference., 1595297, Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference, vol. 2005, pp. 228-229, 2005 International Microprocesses and Nanotechnology Conference, Tokyo, Japan, 05/10/25.

Endo K, Noda S, Ozaki T, Samukawa S, Masahata M, Liu Y et al. A new fabrication technology of FinFETs using a neutral beam etching. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. 2005. p. 228-229. 1595297. (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference).

Endo, Kazuhikp ; Noda, Shuichi ; Ozaki, Takuya et al. / A new fabrication technology of FinFETs using a neutral beam etching. Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. 2005. pp. 228-229 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference).

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author = "Kazuhikp Endo and Shuichi Noda and Takuya Ozaki and Seiji Samukawa and Meishoku Masahata and Yongxun Liu and Kenichi Ishii and Hidenori Takashima and Etsuro Sugimata and Takashi Matsukawa and Yuki Yamauchi and Yuki Ishikawa and Eiichi Suzuki",

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AU - Endo, Kazuhikp

AU - Noda, Shuichi

AU - Ozaki, Takuya

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AU - Masahata, Meishoku

AU - Liu, Yongxun

AU - Ishii, Kenichi

AU - Takashima, Hidenori

AU - Sugimata, Etsuro

AU - Matsukawa, Takashi

AU - Yamauchi, Yuki

AU - Ishikawa, Yuki

AU - Suzuki, Eiichi

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BT - Digest of Papers - Microprocesses and Nanotechnology 2005

T2 - 2005 International Microprocesses and Nanotechnology Conference

Y2 - 25 October 2005 through 28 October 2005

ER -

A new fabrication technology of FinFETs using a neutral beam etching

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ASJC Scopus subject areas

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