A new fabrication technology of FinFETs using a neutral beam etching

Kazuhikp Endo, Shuichi Noda, Takuya Ozaki, Seiji Samukawa, Meishoku Masahata, Yongxun Liu, Kenichi Ishii, Hidenori Takashima, Etsuro Sugimata, Takashi Matsukawa, Yuki Yamauchi, Yuki Ishikawa, Eiichi Suzuki

IFS - Global Collaborative Research and Education Center for Integrated Flow Science (IFS-GCORE)

Tohoku University
National Institute of Advanced Industrial Science and Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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A new fabrication technology of FinFETs using a neutral beam etching

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Engineering

Material Science