A numerical simulation of nanostructure formation utilizing electromigration

Kazuhiko Sasagawa; Shota Fukushi; Yuxin Sun; Masumi Saka

doi:10.1007/s11664-009-0853-9

A numerical simulation of nanostructure formation utilizing electromigration

Kazuhiko Sasagawa, Shota Fukushi, Yuxin Sun, Masumi Saka

ENG - Finemechanics

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

A numerical method to simulate nanostructure formation due to electromigration in passivated Al specimens is developed based on the governing parameter for electromigration damage, AFD* _gen. The nanostructure formation is influenced by conditions such as the current density and substrate temperature. The results of the simulations are verified through experiments, and good agreement between the simulations and experiments is found for changes in nanostructure volume. The simulation is expected to be useful for identifying effective conditions for nanostructure formation.

Original language	English
Pages (from-to)	2201-2206
Number of pages	6
Journal	Journal of Electronic Materials
Volume	38
Issue number	10
DOIs	https://doi.org/10.1007/s11664-009-0853-9
Publication status	Published - 2009 Oct

Keywords

Aluminum
Electromigration
Grain boundary diffusion
Nanostructure
Simulation

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

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10.1007/s11664-009-0853-9

Cite this

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AU - Sasagawa, Kazuhiko

AU - Fukushi, Shota

AU - Sun, Yuxin

AU - Saka, Masumi

PY - 2009/10

Y1 - 2009/10

N2 - A numerical method to simulate nanostructure formation due to electromigration in passivated Al specimens is developed based on the governing parameter for electromigration damage, AFD* gen. The nanostructure formation is influenced by conditions such as the current density and substrate temperature. The results of the simulations are verified through experiments, and good agreement between the simulations and experiments is found for changes in nanostructure volume. The simulation is expected to be useful for identifying effective conditions for nanostructure formation.

AB - A numerical method to simulate nanostructure formation due to electromigration in passivated Al specimens is developed based on the governing parameter for electromigration damage, AFD* gen. The nanostructure formation is influenced by conditions such as the current density and substrate temperature. The results of the simulations are verified through experiments, and good agreement between the simulations and experiments is found for changes in nanostructure volume. The simulation is expected to be useful for identifying effective conditions for nanostructure formation.

KW - Aluminum

KW - Electromigration

KW - Grain boundary diffusion

KW - Nanostructure

KW - Simulation

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EP - 2206

JO - Journal of Electronic Materials

JF - Journal of Electronic Materials

IS - 10

ER -

A numerical simulation of nanostructure formation utilizing electromigration

Abstract

Keywords

ASJC Scopus subject areas

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