TY - JOUR
T1 - A promising evaluation method of ultra-low-expansion glasses for the extreme ultra-violet lithography system by the line-focus-beam ultrasonic material characterization system
AU - Kushibiki, Jun Ichi
AU - Arakawa, Mototaka
AU - Ohashi, Yuji
AU - Suzuki, Kouji
AU - Maruyama, Takahisa
PY - 2004/11/1
Y1 - 2004/11/1
N2 - A super-precise method of evaluating the coefficient of thermal expansion (CTE) of ultra-low-expansion glasses was developed using the line-focus-beam ultrasonic material characterization (LFB-UMC) system and was demonstrated for TiO2-doped SiO2 glass. The sensitivity and resolution in the velocity measurement of leaky surface acoustic waves (LSAWs) in CTE were estimated to be 4.40 (ppb/K)/(m/s) and ±0.77 ppb/K for ±2σ (σ: standard deviation) at 225 MHz. LSAW velocity differences caused by different TiO2 concentrations and distributions or striae in the specimens were successfully detected and evaluated, providing two-dimensional information. This ultrasonic method is effective for evaluating ultra-low-expansion glasses needed for extreme ultra-violet lithography (EUVL) systems.
AB - A super-precise method of evaluating the coefficient of thermal expansion (CTE) of ultra-low-expansion glasses was developed using the line-focus-beam ultrasonic material characterization (LFB-UMC) system and was demonstrated for TiO2-doped SiO2 glass. The sensitivity and resolution in the velocity measurement of leaky surface acoustic waves (LSAWs) in CTE were estimated to be 4.40 (ppb/K)/(m/s) and ±0.77 ppb/K for ±2σ (σ: standard deviation) at 225 MHz. LSAW velocity differences caused by different TiO2 concentrations and distributions or striae in the specimens were successfully detected and evaluated, providing two-dimensional information. This ultrasonic method is effective for evaluating ultra-low-expansion glasses needed for extreme ultra-violet lithography (EUVL) systems.
KW - CTE evaluation
KW - EUVL system
KW - Leaky surface acoustic waves
KW - Line-focus-beam ultrasonic material characterization system
KW - TiO -doped SiO glass
KW - Ultra-low-expansion glasses
KW - Velocity measurement
UR - http://www.scopus.com/inward/record.url?scp=11144347587&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=11144347587&partnerID=8YFLogxK
U2 - 10.1143/JJAP.43.L1455
DO - 10.1143/JJAP.43.L1455
M3 - Article
AN - SCOPUS:11144347587
SN - 0021-4922
VL - 43
SP - L1455-L1457
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 11 A
ER -