TY - JOUR
T1 - A reflection-type vapor cell using anisotropic etching of silicon for micro atomic clocks
AU - Nishino, Hitoshi
AU - Hara, Motoaki
AU - Yano, Yuichiro
AU - Toda, Masaya
AU - Kanamori, Yoshiaki
AU - Kajita, Masatoshi
AU - Ido, Tetsuya
AU - Ono, Takahito
N1 - Funding Information:
Part of this research was performed at Tohoku University Micro System Integration Center and Micro/Nano-Machining Research and Education Center. We would like to acknowledge Mr. Tatsuya Yamada of Nagase Chemtex Corporation for providing a heat-resisting resist. We would like to acknowledge Mr. Michio Toda and Marco Moraja of SAES Getters S. p. A. for their cooperation in providing Rb solid source and getters. This work is partly supported by the Strategic Information and Communications R&D Promotion Programme (SCOPE) from the Ministry of Internal Affairs and Communications, Japan.
Publisher Copyright:
© 2019 The Japan Society of Applied Physics.
PY - 2019/7/1
Y1 - 2019/7/1
N2 - This paper reports the design, fabrication and evaluation of a reflection-type optical Rb vapor cell for chip-scale micro atomic clocks. To reduce the physical package height, the reflection-type vapor cell is developed, in which optical components can be mounted on one side of the vapor cell. A (100)-oriented Si wafer with a cut-off 9.74° toward [011] direction is used to make 45° mirrors by anisotropic wet etching. 90° mirrors are fabricated by Si deep reactive ion etching and surface planarization using H2 annealing. Following the detection of D1 optical absorption for Rb atoms, coherent population trapping resonance was observed.
AB - This paper reports the design, fabrication and evaluation of a reflection-type optical Rb vapor cell for chip-scale micro atomic clocks. To reduce the physical package height, the reflection-type vapor cell is developed, in which optical components can be mounted on one side of the vapor cell. A (100)-oriented Si wafer with a cut-off 9.74° toward [011] direction is used to make 45° mirrors by anisotropic wet etching. 90° mirrors are fabricated by Si deep reactive ion etching and surface planarization using H2 annealing. Following the detection of D1 optical absorption for Rb atoms, coherent population trapping resonance was observed.
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U2 - 10.7567/1882-0786/ab2a3c
DO - 10.7567/1882-0786/ab2a3c
M3 - Article
AN - SCOPUS:85071393908
SN - 1882-0778
VL - 12
JO - Applied Physics Express
JF - Applied Physics Express
IS - 7
M1 - 072012
ER -