A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions

Daisuke Watanabe; Hitoshi Kubota; Yasuo Ando; Terunobu Miyazaki

doi:10.1143/JJAP.43.7489

A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions

Daisuke Watanabe, Hitoshi Kubota, Yasuo Ando, Terunobu Miyazaki

ENG - Applied Physics

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Focused ion beam (FIB) induced tungsten deposition technique was applied to fabrication of small (few-hundred-nanometer scale) magnetic tunnel junctions (MTJs). The deposited tungsten pattern was used as an etching mask and a metal connection between an MTJ and a lead line. This fabrication method can eliminate some difficult process steps so that deep submicronsized MTJs can be fabricated easily and reproducibly. This technique is useful to evaluate basic properties of small MTJs for spin-electronics devices.

Original language	English
Pages (from-to)	7489-7490
Number of pages	2
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	43
Issue number	11 A
DOIs	https://doi.org/10.1143/JJAP.43.7489
Publication status	Published - 2004 Nov

Keywords

Focused ion beam induced deposition
Magnetic tunnel junctions
Submicron
Tungsten

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/JJAP.43.7489

Cite this

@article{9234ffecba754addbcb26397ade9f275,

title = "A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions",

abstract = "Focused ion beam (FIB) induced tungsten deposition technique was applied to fabrication of small (few-hundred-nanometer scale) magnetic tunnel junctions (MTJs). The deposited tungsten pattern was used as an etching mask and a metal connection between an MTJ and a lead line. This fabrication method can eliminate some difficult process steps so that deep submicronsized MTJs can be fabricated easily and reproducibly. This technique is useful to evaluate basic properties of small MTJs for spin-electronics devices.",

keywords = "Focused ion beam induced deposition, Magnetic tunnel junctions, Submicron, Tungsten",

author = "Daisuke Watanabe and Hitoshi Kubota and Yasuo Ando and Terunobu Miyazaki",

year = "2004",

month = nov,

doi = "10.1143/JJAP.43.7489",

language = "English",

volume = "43",

pages = "7489--7490",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "11 A",

}

TY - JOUR

T1 - A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions

AU - Watanabe, Daisuke

AU - Kubota, Hitoshi

AU - Ando, Yasuo

AU - Miyazaki, Terunobu

PY - 2004/11

Y1 - 2004/11

N2 - Focused ion beam (FIB) induced tungsten deposition technique was applied to fabrication of small (few-hundred-nanometer scale) magnetic tunnel junctions (MTJs). The deposited tungsten pattern was used as an etching mask and a metal connection between an MTJ and a lead line. This fabrication method can eliminate some difficult process steps so that deep submicronsized MTJs can be fabricated easily and reproducibly. This technique is useful to evaluate basic properties of small MTJs for spin-electronics devices.

AB - Focused ion beam (FIB) induced tungsten deposition technique was applied to fabrication of small (few-hundred-nanometer scale) magnetic tunnel junctions (MTJs). The deposited tungsten pattern was used as an etching mask and a metal connection between an MTJ and a lead line. This fabrication method can eliminate some difficult process steps so that deep submicronsized MTJs can be fabricated easily and reproducibly. This technique is useful to evaluate basic properties of small MTJs for spin-electronics devices.

KW - Focused ion beam induced deposition

KW - Magnetic tunnel junctions

KW - Submicron

KW - Tungsten

UR - http://www.scopus.com/inward/record.url?scp=11144240467&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=11144240467&partnerID=8YFLogxK

U2 - 10.1143/JJAP.43.7489

DO - 10.1143/JJAP.43.7489

M3 - Article

AN - SCOPUS:11144240467

SN - 0021-4922

VL - 43

SP - 7489

EP - 7490

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 11 A

ER -

A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this