A soft-X-ray imaging microscope with a multilayer-coated schwarzschild objective: Imaging tests

Mitsunori Toyoda; Yoshitaka Shitani; Mihiro Yanagihara; Takeo Ejima; Masaki Yamamoto; Makoto Watanabe

doi:10.1143/jjap.39.1926

A soft-X-ray imaging microscope with a multilayer-coated schwarzschild objective: Imaging tests

Mitsunori Toyoda, Yoshitaka Shitani, Mihiro Yanagihara, Takeo Ejima, Masaki Yamamoto, Makoto Watanabe

SRIS - SR Core Research Division

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28 Citations (Scopus)

Abstract

We constructed a soft-X-ray imaging microscope based on a multilayer-coated Schwarzschild objective. It provides an element-sensitive image in terms of the characteristic soft X-rays selectively reflected by the multilayer coating. The Schwarzschild objective was designed to have a 50× magnification and a numerical aperture of 0.25. The mirrors of the objective were coated with Mo/Si multilayers to reflect the Si L emission. The overall throughput of the objective was 14% at a peak wavelength of 13.3 nm. The 5-μm-wide stripe of lithographically patterned SiO₂ was observed under irradiation with an electron beam of 1 μA accelerated to 2.5 kV.

Original language	English
Pages (from-to)	1926-1929
Number of pages	4
Journal	Japanese Journal of Applied Physics
Volume	39
Issue number	4 A
DOIs	https://doi.org/10.1143/jjap.39.1926
Publication status	Published - 2000

Keywords

Imaging microscope
Microscope
Multilayer
Normal incidence optics
Soft-X-ray emission

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10.1143/jjap.39.1926

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abstract = "We constructed a soft-X-ray imaging microscope based on a multilayer-coated Schwarzschild objective. It provides an element-sensitive image in terms of the characteristic soft X-rays selectively reflected by the multilayer coating. The Schwarzschild objective was designed to have a 50× magnification and a numerical aperture of 0.25. The mirrors of the objective were coated with Mo/Si multilayers to reflect the Si L emission. The overall throughput of the objective was 14% at a peak wavelength of 13.3 nm. The 5-μm-wide stripe of lithographically patterned SiO2 was observed under irradiation with an electron beam of 1 μA accelerated to 2.5 kV.",

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AU - Toyoda, Mitsunori

AU - Shitani, Yoshitaka

AU - Yanagihara, Mihiro

AU - Ejima, Takeo

AU - Yamamoto, Masaki

AU - Watanabe, Makoto

PY - 2000

Y1 - 2000

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AB - We constructed a soft-X-ray imaging microscope based on a multilayer-coated Schwarzschild objective. It provides an element-sensitive image in terms of the characteristic soft X-rays selectively reflected by the multilayer coating. The Schwarzschild objective was designed to have a 50× magnification and a numerical aperture of 0.25. The mirrors of the objective were coated with Mo/Si multilayers to reflect the Si L emission. The overall throughput of the objective was 14% at a peak wavelength of 13.3 nm. The 5-μm-wide stripe of lithographically patterned SiO2 was observed under irradiation with an electron beam of 1 μA accelerated to 2.5 kV.

KW - Imaging microscope

KW - Microscope

KW - Multilayer

KW - Normal incidence optics

KW - Soft-X-ray emission

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JO - Japanese Journal of Applied Physics

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A soft-X-ray imaging microscope with a multilayer-coated schwarzschild objective: Imaging tests

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Keywords

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