A study on positive photosensitive epoxy resins using reaction development patterning (RDP)

Wei Min Zhou; Takafumi Fukushima; Masao Tomoi; Toshiyuki Oyama

doi:10.2494/photopolymer.27.713

A study on positive photosensitive epoxy resins using reaction development patterning (RDP)

Wei Min Zhou, Takafumi Fukushima, Masao Tomoi, Toshiyuki Oyama

ENG - Mechanical Systems Engineering

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

In this study, we successfully fabricated positive photosensitive epoxy resins based on the Reaction Development Patterning (RDP) by using B-staged polymers prepared by polyaddition between an epoxy base resin and an acid anhydride curing agent during mixing and prebaking processes. Application of RDP to the B-staged polymers afforded positive fine patterns by the use of 15-mol% sodium 2-aminoethoxide in ethanolamine/NMP mixtures. Furthermore, the fine epoxy patterns were not deformed after heat treatment for complete curing, indicating that the cress-linked epoxy patterns have high tolerability to thermal stresses. These results suggest the possibility of practical application of RDP-based positive photosensitive epoxy resins.

Original language	English
Pages (from-to)	713-717
Number of pages	5
Journal	Journal of Photopolymer Science and Technology
Volume	27
Issue number	6
DOIs	https://doi.org/10.2494/photopolymer.27.713
Publication status	Published - 2015 Jan 28

Keywords

Photosensitive epoxy resin
Positive patterns
RDP
Reaction development patterning

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10.2494/photopolymer.27.713

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title = "A study on positive photosensitive epoxy resins using reaction development patterning (RDP)",

abstract = "In this study, we successfully fabricated positive photosensitive epoxy resins based on the Reaction Development Patterning (RDP) by using B-staged polymers prepared by polyaddition between an epoxy base resin and an acid anhydride curing agent during mixing and prebaking processes. Application of RDP to the B-staged polymers afforded positive fine patterns by the use of 15-mol% sodium 2-aminoethoxide in ethanolamine/NMP mixtures. Furthermore, the fine epoxy patterns were not deformed after heat treatment for complete curing, indicating that the cress-linked epoxy patterns have high tolerability to thermal stresses. These results suggest the possibility of practical application of RDP-based positive photosensitive epoxy resins.",

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AU - Zhou, Wei Min

AU - Fukushima, Takafumi

AU - Tomoi, Masao

AU - Oyama, Toshiyuki

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Y1 - 2015/1/28

N2 - In this study, we successfully fabricated positive photosensitive epoxy resins based on the Reaction Development Patterning (RDP) by using B-staged polymers prepared by polyaddition between an epoxy base resin and an acid anhydride curing agent during mixing and prebaking processes. Application of RDP to the B-staged polymers afforded positive fine patterns by the use of 15-mol% sodium 2-aminoethoxide in ethanolamine/NMP mixtures. Furthermore, the fine epoxy patterns were not deformed after heat treatment for complete curing, indicating that the cress-linked epoxy patterns have high tolerability to thermal stresses. These results suggest the possibility of practical application of RDP-based positive photosensitive epoxy resins.

AB - In this study, we successfully fabricated positive photosensitive epoxy resins based on the Reaction Development Patterning (RDP) by using B-staged polymers prepared by polyaddition between an epoxy base resin and an acid anhydride curing agent during mixing and prebaking processes. Application of RDP to the B-staged polymers afforded positive fine patterns by the use of 15-mol% sodium 2-aminoethoxide in ethanolamine/NMP mixtures. Furthermore, the fine epoxy patterns were not deformed after heat treatment for complete curing, indicating that the cress-linked epoxy patterns have high tolerability to thermal stresses. These results suggest the possibility of practical application of RDP-based positive photosensitive epoxy resins.

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KW - Positive patterns

KW - RDP

KW - Reaction development patterning

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A study on positive photosensitive epoxy resins using reaction development patterning (RDP)

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