TY - JOUR
T1 - A test circuit for extremely low gate leakage current measurement of 10 aA for 80 000 MOSFETs in 80 s
AU - Inatsuka, Takuya
AU - Kumagai, Yuki
AU - Kuroda, Rihito
AU - Teramoto, Akinobu
AU - Suwa, Tomoyuki
AU - Sugawa, Shigetoshi
AU - Ohmi, Tadahiro
PY - 2013
Y1 - 2013
N2 - We discuss the measurement accuracy of the test circuit, which can evaluate statistical characteristics of gate leakage current of small area metal-oxide-semiconductor field-effect transistors (MOSFETs) in a very short time. The accuracy and precision of the gate leakage current obtained by the test circuit are verified for a wide range. As a result it is confirmed that very accurate gate current of 10-17 A±10\% is able to be measured with this method. Using this test circuit, we can evaluate the gate leakage current at a wide electric field range, which is important in discussing the conduction mechanism of gate leakage current.
AB - We discuss the measurement accuracy of the test circuit, which can evaluate statistical characteristics of gate leakage current of small area metal-oxide-semiconductor field-effect transistors (MOSFETs) in a very short time. The accuracy and precision of the gate leakage current obtained by the test circuit are verified for a wide range. As a result it is confirmed that very accurate gate current of 10-17 A±10\% is able to be measured with this method. Using this test circuit, we can evaluate the gate leakage current at a wide electric field range, which is important in discussing the conduction mechanism of gate leakage current.
KW - Electrical stress
KW - gate leakage current
KW - low current measurement
KW - MOSFET
KW - statistical evaluation
KW - test circuit
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U2 - 10.1109/TSM.2013.2260568
DO - 10.1109/TSM.2013.2260568
M3 - Article
AN - SCOPUS:84881366529
SN - 0894-6507
VL - 26
SP - 288
EP - 295
JO - IEEE Transactions on Semiconductor Manufacturing
JF - IEEE Transactions on Semiconductor Manufacturing
IS - 3
M1 - 6512020
ER -