Ab initio calculation of F atom desorption in tungsten chemical vapor deposition process using WF6 and H2

Kazuhito Nishitani; Shigeyuki Takagi; Masaaki Kanoh; Toshiyuki Yokosuka; Katsumi Sasata; Tomonori Kusagaya; Seiichi Takami; Momoji Kubo; Akira Miyamoto

doi:10.1143/jjap.42.5751

Ab initio calculation of F atom desorption in tungsten chemical vapor deposition process using WF₆ and H₂

Kazuhito Nishitani, Shigeyuki Takagi, Masaaki Kanoh, Toshiyuki Yokosuka, Katsumi Sasata, Tomonori Kusagaya, Seiichi Takami, Momoji Kubo, Akira Miyamoto

IMR - Materials Design Division

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Chemical vapor deposition (CVD) of tungsten is widely used in semiconductor devices. In this process, although many atoms are expected to adsorb on a surface during the deposition, the behavior of these atoms has not been understood well. In this study, we have first investigated the reduction step of F adsorbates by H adsorbates on a W surface by density functional theory. The calculated reaction heat (36.5 kcal/mol) is in good agreement with the experimentally estimated value.

Original language	English
Pages (from-to)	5751-5752
Number of pages	2
Journal	Japanese Journal of Applied Physics
Volume	42
Issue number	9 A
DOIs	https://doi.org/10.1143/jjap.42.5751
Publication status	Published - 2003 Sept

Keywords

Activation energy
CVD
Density functional theory
Tungsten

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10.1143/jjap.42.5751

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title = "Ab initio calculation of F atom desorption in tungsten chemical vapor deposition process using WF6 and H2",

abstract = "Chemical vapor deposition (CVD) of tungsten is widely used in semiconductor devices. In this process, although many atoms are expected to adsorb on a surface during the deposition, the behavior of these atoms has not been understood well. In this study, we have first investigated the reduction step of F adsorbates by H adsorbates on a W surface by density functional theory. The calculated reaction heat (36.5 kcal/mol) is in good agreement with the experimentally estimated value.",

keywords = "Activation energy, CVD, Density functional theory, Tungsten",

author = "Kazuhito Nishitani and Shigeyuki Takagi and Masaaki Kanoh and Toshiyuki Yokosuka and Katsumi Sasata and Tomonori Kusagaya and Seiichi Takami and Momoji Kubo and Akira Miyamoto",

year = "2003",

month = sep,

doi = "10.1143/jjap.42.5751",

language = "English",

volume = "42",

pages = "5751--5752",

journal = "Japanese Journal of Applied Physics",

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publisher = "Japan Society of Applied Physics",

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TY - JOUR

T1 - Ab initio calculation of F atom desorption in tungsten chemical vapor deposition process using WF6 and H2

AU - Nishitani, Kazuhito

AU - Takagi, Shigeyuki

AU - Kanoh, Masaaki

AU - Yokosuka, Toshiyuki

AU - Sasata, Katsumi

AU - Kusagaya, Tomonori

AU - Takami, Seiichi

AU - Kubo, Momoji

AU - Miyamoto, Akira

PY - 2003/9

Y1 - 2003/9

N2 - Chemical vapor deposition (CVD) of tungsten is widely used in semiconductor devices. In this process, although many atoms are expected to adsorb on a surface during the deposition, the behavior of these atoms has not been understood well. In this study, we have first investigated the reduction step of F adsorbates by H adsorbates on a W surface by density functional theory. The calculated reaction heat (36.5 kcal/mol) is in good agreement with the experimentally estimated value.

AB - Chemical vapor deposition (CVD) of tungsten is widely used in semiconductor devices. In this process, although many atoms are expected to adsorb on a surface during the deposition, the behavior of these atoms has not been understood well. In this study, we have first investigated the reduction step of F adsorbates by H adsorbates on a W surface by density functional theory. The calculated reaction heat (36.5 kcal/mol) is in good agreement with the experimentally estimated value.

KW - Activation energy

KW - CVD

KW - Density functional theory

KW - Tungsten

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DO - 10.1143/jjap.42.5751

M3 - Article

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SN - 0021-4922

VL - 42

SP - 5751

EP - 5752

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 9 A

ER -

Ab initio calculation of F atom desorption in tungsten chemical vapor deposition process using WF₆ and H₂

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Keywords

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