TY - JOUR
T1 - Accurate measurements of intrinsic scattering from window materials by use of a vacuum camera
AU - Masunaga, Hiroyasu
AU - Sakurai, Kazuo
AU - Akiba, Isamu
AU - Ito, Kazuki
AU - Takata, Masaki
N1 - Funding Information:
Authors would like to acknowledge and extend heartfelt gratitude to DRDO, Govt. of India, for the financial assistance in executing this research work.
PY - 2013/4
Y1 - 2013/4
N2 - The intrinsic scattering from eight window materials commonly used at synchrotron facilities has been evaluated in the range 0.07 < q < 4 nm-1 by the use of a vacuum camera. Poly(oxydiphenylene- pyromellitimide) film, a polyimide film widely used as a window material for vacuum chambers, gave rise to two peaks at q = 0.8 and 4 nm-1. Poly(ether-ether-ketone) gave no Bragg peaks, although the background scattering was relatively high over the entire q range. When natural mica, synthetic mica, quartz glass, beryllium, silicon nitride and silicon carbide were compared, synthetic mica showed the lowest scattering in the range 0.6 < q < 5 nm-1, indicating that it is the most suitable window material for this q range.
AB - The intrinsic scattering from eight window materials commonly used at synchrotron facilities has been evaluated in the range 0.07 < q < 4 nm-1 by the use of a vacuum camera. Poly(oxydiphenylene- pyromellitimide) film, a polyimide film widely used as a window material for vacuum chambers, gave rise to two peaks at q = 0.8 and 4 nm-1. Poly(ether-ether-ketone) gave no Bragg peaks, although the background scattering was relatively high over the entire q range. When natural mica, synthetic mica, quartz glass, beryllium, silicon nitride and silicon carbide were compared, synthetic mica showed the lowest scattering in the range 0.6 < q < 5 nm-1, indicating that it is the most suitable window material for this q range.
KW - small-angle X-ray scattering
KW - synchrotron radiation
KW - vacuum cameras
KW - window materials
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U2 - 10.1107/S0021889813002628
DO - 10.1107/S0021889813002628
M3 - Article
AN - SCOPUS:84875208056
SN - 0021-8898
VL - 46
SP - 577
EP - 579
JO - Journal of Applied Crystallography
JF - Journal of Applied Crystallography
IS - 2
ER -