Abstract
The abstraction reaction of D adatoms by H atoms have been investigated on the Si(1 1 0) surfaces. The direct abstraction to form HD molecules obeys a second-order rate law in D coverage θD. On the other hand, the indirect abstraction to form D2 molecules obeys a fourth-order rate law in θD. In addition to the direct abstraction, indirect abstraction to form HD molecules is also included due to piled H adatoms during H exposure. It is found that the indirect abstraction is promoted on the surfaces saturated with dideuterides, suggesting that dideuterides (dihydrides) play a significant role in the indirect abstraction paths. The kinetics of the abstraction reactions on the Si(1 1 0) surfaces look similar to those on the Si(1 0 0) surface. However, the delayed D2 desorption exhibits time profiles different from those on the Si(1 0 0) surfaces.
Original language | English |
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Pages (from-to) | 1979-1986 |
Number of pages | 8 |
Journal | Surface Science |
Volume | 602 |
Issue number | 11 |
DOIs | |
Publication status | Published - 2008 Jun 1 |
Keywords
- Atom-solid interactions
- FTIR
- H-sticking
- Hot complex
- Momentary coverages
- Plasma processing
- Thermal desorption
- Time response
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry