Advanced plasma science and its applications for nitride and nanomaterials

Satoshi Kamiyama; Yasufumi Fujiwara; Mineo Hiramatsu; Masafumi Ito; Toshiro Kaneko; Makoto Kasu; Hideto Miyake; Keiji Nakamura; Kazuaki Sawada; Makoto Sekine; Yuichi Setsuhara; Tatsuru Shirafuji; Hirofumi Takikawa; Kazuo Terashima; Akihiro Wakahara; Yoshimi Watanabe

doi:10.7567/JJAP.53.11R001

Advanced plasma science and its applications for nitride and nanomaterials

Satoshi Kamiyama, Yasufumi Fujiwara, Mineo Hiramatsu, Masafumi Ito, Toshiro Kaneko, Makoto Kasu, Hideto Miyake, Keiji Nakamura, Kazuaki Sawada, Makoto Sekine, Yuichi Setsuhara, Tatsuru Shirafuji, Hirofumi Takikawa, Kazuo Terashima, Akihiro Wakahara, Yoshimi Watanabe

ENG - Electronic Engineering

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Original language	English
Article number	11R001
Journal	Japanese Journal of Applied Physics
Volume	53
Issue number	11
DOIs	https://doi.org/10.7567/JJAP.53.11R001
Publication status	Published - 2014 Nov 1

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Kamiyama, S., Fujiwara, Y., Hiramatsu, M., Ito, M., Kaneko, T., Kasu, M., Miyake, H., Nakamura, K., Sawada, K., Sekine, M., Setsuhara, Y., Shirafuji, T., Takikawa, H., Terashima, K., Wakahara, A., & Watanabe, Y. (2014). Advanced plasma science and its applications for nitride and nanomaterials. Japanese Journal of Applied Physics, 53(11), Article 11R001. https://doi.org/10.7567/JJAP.53.11R001

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title = "Advanced plasma science and its applications for nitride and nanomaterials",

author = "Satoshi Kamiyama and Yasufumi Fujiwara and Mineo Hiramatsu and Masafumi Ito and Toshiro Kaneko and Makoto Kasu and Hideto Miyake and Keiji Nakamura and Kazuaki Sawada and Makoto Sekine and Yuichi Setsuhara and Tatsuru Shirafuji and Hirofumi Takikawa and Kazuo Terashima and Akihiro Wakahara and Yoshimi Watanabe",

note = "Funding Information: Acknowledgements: We thank Dr. T. ZABOTINA for help in F ACScan-analysis. This work was supported by grants 93-04-21355 from the Russian Foundation for Basic Research.",

year = "2014",

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doi = "10.7567/JJAP.53.11R001",

language = "English",

volume = "53",

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Kamiyama, S, Fujiwara, Y, Hiramatsu, M, Ito, M, Kaneko, T, Kasu, M, Miyake, H, Nakamura, K, Sawada, K, Sekine, M, Setsuhara, Y, Shirafuji, T, Takikawa, H, Terashima, K, Wakahara, A & Watanabe, Y 2014, 'Advanced plasma science and its applications for nitride and nanomaterials', Japanese Journal of Applied Physics, vol. 53, no. 11, 11R001. https://doi.org/10.7567/JJAP.53.11R001

TY - JOUR

T1 - Advanced plasma science and its applications for nitride and nanomaterials

AU - Kamiyama, Satoshi

AU - Fujiwara, Yasufumi

AU - Hiramatsu, Mineo

AU - Ito, Masafumi

AU - Kaneko, Toshiro

AU - Kasu, Makoto

AU - Miyake, Hideto

AU - Nakamura, Keiji

AU - Sawada, Kazuaki

AU - Sekine, Makoto

AU - Setsuhara, Yuichi

AU - Shirafuji, Tatsuru

AU - Takikawa, Hirofumi

AU - Terashima, Kazuo

AU - Wakahara, Akihiro

AU - Watanabe, Yoshimi

N1 - Funding Information: Acknowledgements: We thank Dr. T. ZABOTINA for help in F ACScan-analysis. This work was supported by grants 93-04-21355 from the Russian Foundation for Basic Research.

PY - 2014/11/1

Y1 - 2014/11/1

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U2 - 10.7567/JJAP.53.11R001

DO - 10.7567/JJAP.53.11R001

M3 - Article

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SN - 0021-4922

VL - 53

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 11

M1 - 11R001

ER -

Advanced plasma science and its applications for nitride and nanomaterials

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