Al2O3-Ta2O5-ZrO2 thin films having high corrosion resistance to strong acid and alkali solutions

Shinji Katayama; Noboru Akao; Nobuyoshi Hara; Katsuhisa Sugimoto

doi:10.1149/1.1945607

Al₂O₃-Ta₂O₅-ZrO₂ thin films having high corrosion resistance to strong acid and alkali solutions

Shinji Katayama, Noboru Akao, Nobuyoshi Hara, Katsuhisa Sugimoto

ENG - Graduate School of Engineering (Common - Materials Science and Engineering)

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

In order to develop an insulator film for an electrolyte-insulator- semiconductor capacitor pH sensor which can be used in a wide pH range, the corrosion resistance of Al₂O₃-Ta₂O ₅-ZrO₂ films formed by metallorganic chemical vapor deposition has been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HCl and 1 M NaOH solutions. The films with the cationic mole fraction of Al, X_Al, smaller than 0.4, the cationic mole fraction of Ta, X_Ta, larger than 0.3, and the cationic mole fraction of Zr, X_Zr, larger than 0.3 showed high corrosion resistance against both solutions.

Original language	English
Pages (from-to)	B286-B290
Journal	Journal of the Electrochemical Society
Volume	152
Issue number	8
DOIs	https://doi.org/10.1149/1.1945607
Publication status	Published - 2005

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Renewable Energy, Sustainability and the Environment
Surfaces, Coatings and Films
Electrochemistry
Materials Chemistry

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1149/1.1945607

Cite this

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abstract = "In order to develop an insulator film for an electrolyte-insulator- semiconductor capacitor pH sensor which can be used in a wide pH range, the corrosion resistance of Al2O3-Ta2O 5-ZrO2 films formed by metallorganic chemical vapor deposition has been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HCl and 1 M NaOH solutions. The films with the cationic mole fraction of Al, XAl, smaller than 0.4, the cationic mole fraction of Ta, XTa, larger than 0.3, and the cationic mole fraction of Zr, XZr, larger than 0.3 showed high corrosion resistance against both solutions.",

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AU - Sugimoto, Katsuhisa

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