Abstract
We studied the process of oxygen transfer from a quartz crucible to a multicrystalline silicon during unidirectional solidification process. We investigated the boundary layer thickness of oxygen concentration near a crucible wall region using Fourier transform infrared spectrometer (FTIR) measurement. The results suggest that oxygen concentration was increased near a crucible wall, and the boundary layer thickness of oxygen concentration was estimated to be 2-6 mm. The estimated value of boundary layer thickness of oxygen concentrations is similar to those estimated by analytical and numerical calculation. These results suggest that the oxygen was dissolved from a crucible wall through the liner made of Si3N4 to the melt during growth process.
Original language | English |
---|---|
Pages (from-to) | 2204-2208 |
Number of pages | 5 |
Journal | Journal of Crystal Growth |
Volume | 310 |
Issue number | 7-9 |
DOIs | |
Publication status | Published - 2008 Apr |
Externally published | Yes |
Keywords
- A1. Directional solidification
- A1. Impurities
- B2. Semiconducting silicon
- B3. Solar cells
ASJC Scopus subject areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry