Abstract
We derived analytical models for the current-voltage characteristics of double-gate silicon-on-insulator metal- oxide-semiconductor-field-effect-transistors. In the subthreshold region, we derived an analytical subthreshold slope model considering both depleted and induced charges. We proposed a unique definition of threshold voltage of the device, and showed that the threshold voltage is close to the experimentally defined threshold voltage at which the drain current has a specific value. The variation in the surface potential after the threshold voltage was modeled, and hence the models are valid in the moderate-inversion region as well as in the strong-inversion region. The models agree well with experimental data.
Original language | English |
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Pages (from-to) | 4916-4922 |
Number of pages | 7 |
Journal | Japanese Journal of Applied Physics |
Volume | 32 |
Issue number | 11 R |
DOIs | |
Publication status | Published - 1993 Nov |
Keywords
- Analytical model
- CMOS
- Double-gate
- SOI