Anisotropically etched Si mold for solid polymer dye microcavity laser

Minoru Sasaki; Yigui Li; Yoshinori Akatu; Takehiro Fujii; Kazuhiro Hane

doi:10.1143/jjap.39.7145

Anisotropically etched Si mold for solid polymer dye microcavity laser

Minoru Sasaki, Yigui Li, Yoshinori Akatu, Takehiro Fujii, Kazuhiro Hane

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

A new method for solid polymer dye microcavity laser fabrication is described. The hexagonal prism-shaped cavity is fabricated using a mold of Si (111) wafer. Dry etching is used to form the main shape of the cavity, and subsequent anisotropic etching is applied for a short time to smooth the etched surface. The etchant used is ethylenediamine pyrocatechol and water. From this Si mold, an array of hundreds of microcavity replicas are obtained at once. The lasing from the fabricated cavities is confirmed by sharp peaks in the emission spectrum.

Original language	English
Pages (from-to)	7145-7149
Number of pages	5
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	39
Issue number	12 B
DOIs	https://doi.org/10.1143/jjap.39.7145
Publication status	Published - 2000 Dec

Keywords

Anisotropic etching
Dye laser
Microcavity
Si mold
Smooth surface

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/jjap.39.7145

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abstract = "A new method for solid polymer dye microcavity laser fabrication is described. The hexagonal prism-shaped cavity is fabricated using a mold of Si (111) wafer. Dry etching is used to form the main shape of the cavity, and subsequent anisotropic etching is applied for a short time to smooth the etched surface. The etchant used is ethylenediamine pyrocatechol and water. From this Si mold, an array of hundreds of microcavity replicas are obtained at once. The lasing from the fabricated cavities is confirmed by sharp peaks in the emission spectrum.",

keywords = "Anisotropic etching, Dye laser, Microcavity, Si mold, Smooth surface",

author = "Minoru Sasaki and Yigui Li and Yoshinori Akatu and Takehiro Fujii and Kazuhiro Hane",

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doi = "10.1143/jjap.39.7145",

language = "English",

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T1 - Anisotropically etched Si mold for solid polymer dye microcavity laser

AU - Sasaki, Minoru

AU - Li, Yigui

AU - Akatu, Yoshinori

AU - Fujii, Takehiro

AU - Hane, Kazuhiro

PY - 2000/12

Y1 - 2000/12

N2 - A new method for solid polymer dye microcavity laser fabrication is described. The hexagonal prism-shaped cavity is fabricated using a mold of Si (111) wafer. Dry etching is used to form the main shape of the cavity, and subsequent anisotropic etching is applied for a short time to smooth the etched surface. The etchant used is ethylenediamine pyrocatechol and water. From this Si mold, an array of hundreds of microcavity replicas are obtained at once. The lasing from the fabricated cavities is confirmed by sharp peaks in the emission spectrum.

AB - A new method for solid polymer dye microcavity laser fabrication is described. The hexagonal prism-shaped cavity is fabricated using a mold of Si (111) wafer. Dry etching is used to form the main shape of the cavity, and subsequent anisotropic etching is applied for a short time to smooth the etched surface. The etchant used is ethylenediamine pyrocatechol and water. From this Si mold, an array of hundreds of microcavity replicas are obtained at once. The lasing from the fabricated cavities is confirmed by sharp peaks in the emission spectrum.

KW - Anisotropic etching

KW - Dye laser

KW - Microcavity

KW - Si mold

KW - Smooth surface

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JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 12 B

ER -

Anisotropically etched Si mold for solid polymer dye microcavity laser

Abstract

Keywords

ASJC Scopus subject areas

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