Anisotropically etched Si mold for solid polymer dye microcavity laser

Minoru Sasaki, Yigui Li, Yoshinori Akatu, Takehiro Fujii, Kazuhiro Hane

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)


A new method for solid polymer dye microcavity laser fabrication is described. The hexagonal prism-shaped cavity is fabricated using a mold of Si (111) wafer. Dry etching is used to form the main shape of the cavity, and subsequent anisotropic etching is applied for a short time to smooth the etched surface. The etchant used is ethylenediamine pyrocatechol and water. From this Si mold, an array of hundreds of microcavity replicas are obtained at once. The lasing from the fabricated cavities is confirmed by sharp peaks in the emission spectrum.

Original languageEnglish
Pages (from-to)7145-7149
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number12 B
Publication statusPublished - 2000 Dec


  • Anisotropic etching
  • Dye laser
  • Microcavity
  • Si mold
  • Smooth surface

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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