TY - JOUR
T1 - Antireflection sub-wavelength gratings fabricated by spin-coating replication
AU - Kanamori, Y.
AU - Roy, E.
AU - Chen, Y.
N1 - Funding Information:
This work was partially supported by European Commission through Project No. IST-2001-37472 (Souvenir). The authors thank the CNRS-LPN clean room service for technical assistance and Prof. H. Fujita, Prof. D. Collard, and Mr. M. Belotti for help discussions. One of the authors (Y. Kanamori) acknowledges the CNRS-STIC department for financial support and the Center for International Research on MicroMechatronics ( CiRMM ) for valuable help during his staying in France.
PY - 2005/3
Y1 - 2005/3
N2 - We fabricated an antireflection subwavelength grating (SWG) on a polymethyl methacrylate (PMMA) by a spin-coating replication technique. Silicon molds of a two-dimensional tapered grating of 200 nm period and 90 nm deep have been obtained using electron beam lithography and reactive ion etching. Replication has been done by direct spin-coating a 9.35 μm thick PMMA on the mold, followed by an appropriate mounting on a glass substrate. The transmittance in the wavelength region ranging from 500 to 800 nm was measured and compared with the calculation results on the basis of rigorous coupled-wave analysis. At these wavelengths, the transmittance of the SWG was increased in comparison with that of the flat PMMA sheet, in good agreement with the theoretical calculations.
AB - We fabricated an antireflection subwavelength grating (SWG) on a polymethyl methacrylate (PMMA) by a spin-coating replication technique. Silicon molds of a two-dimensional tapered grating of 200 nm period and 90 nm deep have been obtained using electron beam lithography and reactive ion etching. Replication has been done by direct spin-coating a 9.35 μm thick PMMA on the mold, followed by an appropriate mounting on a glass substrate. The transmittance in the wavelength region ranging from 500 to 800 nm was measured and compared with the calculation results on the basis of rigorous coupled-wave analysis. At these wavelengths, the transmittance of the SWG was increased in comparison with that of the flat PMMA sheet, in good agreement with the theoretical calculations.
KW - Antireflection
KW - Mold
KW - Nanoimprint lithography
KW - Polymethyl methacrylate
KW - Replication
KW - Rigorous coupled-wave analysis
KW - Subwavelength gratings
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U2 - 10.1016/j.mee.2004.12.039
DO - 10.1016/j.mee.2004.12.039
M3 - Conference article
AN - SCOPUS:14944361883
SN - 0167-9317
VL - 78-79
SP - 287
EP - 293
JO - Microelectronic Engineering
JF - Microelectronic Engineering
IS - 1-4
T2 - Proceedings of the 30th International Conference on Micro- and Nano-Engineering
Y2 - 19 September 2004 through 22 September 2004
ER -