Application of rotation magnet sputtering technology to a-IGZO film depositions

Tetsuya Goto, Shigetoshi Sugawa, Tadahiro Ohmi

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


We developed new magnetron sputtering equipment called rotation magnet sputtering (RMS), where multiple moving plasma loops are exited on the planar target surface, obtaining high target utilization. The moving plasma loops also worked efficiently to homogenize the spatial distribution of a-IGZO film qualities by time-averaged homogenization effect.

Original languageEnglish
Pages (from-to)5-8
Number of pages4
JournalDigest of Technical Papers - SID International Symposium
Issue number1
Publication statusPublished - 2014 Jun


  • InGaZnO
  • TFT
  • rotation magnet sputtering


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