TY - JOUR
T1 - Application of rotation magnet sputtering technology to a-IGZO film depositions
AU - Goto, Tetsuya
AU - Sugawa, Shigetoshi
AU - Ohmi, Tadahiro
PY - 2014/6
Y1 - 2014/6
N2 - We developed new magnetron sputtering equipment called rotation magnet sputtering (RMS), where multiple moving plasma loops are exited on the planar target surface, obtaining high target utilization. The moving plasma loops also worked efficiently to homogenize the spatial distribution of a-IGZO film qualities by time-averaged homogenization effect.
AB - We developed new magnetron sputtering equipment called rotation magnet sputtering (RMS), where multiple moving plasma loops are exited on the planar target surface, obtaining high target utilization. The moving plasma loops also worked efficiently to homogenize the spatial distribution of a-IGZO film qualities by time-averaged homogenization effect.
KW - InGaZnO
KW - TFT
KW - rotation magnet sputtering
UR - http://www.scopus.com/inward/record.url?scp=84905049796&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84905049796&partnerID=8YFLogxK
U2 - 10.1002/j.2168-0159.2014.tb00002.x
DO - 10.1002/j.2168-0159.2014.tb00002.x
M3 - Article
AN - SCOPUS:84905049796
SN - 0097-966X
VL - 45
SP - 5
EP - 8
JO - Digest of Technical Papers - SID International Symposium
JF - Digest of Technical Papers - SID International Symposium
IS - 1
ER -