Application of thin-film amorphous silicon to chemical imaging

Tatsuo Yoshinobu, Werner Moritz, Friedhelm Finger, Michael J. Schoening

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

A thin-film amorphous silicon (a-Si) deposited on a glass substrate was employed as a semiconductor material for the chemical imaging sensor, which can visualize the distribution of ion concentration in a solution. The sensing properties and the spatial resolution of the a-Si sensors were investigated. Nearly-Nernstian pH sensitivities and submicron resolution were demonstrated, which suggests the superior performance of the chemical imaging sensor based on thin-film a-Si.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2006
Pages481-490
Number of pages10
Publication statusPublished - 2007
Event2006 MRS Spring Meeting - San Francisco, CA, United States
Duration: 2006 Apr 182006 Apr 21

Publication series

NameMaterials Research Society Symposium Proceedings
Volume910
ISSN (Print)0272-9172

Conference

Conference2006 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period06/4/1806/4/21

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