Applications of polysilanes for a negative-tone resist in ion beam lithography

Yoshinori Matsui, Shu Seki, Satoshi Tsukuda, Takahiro Kozawa, Seiichi Tagawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fingerprint

Dive into the research topics of 'Applications of polysilanes for a negative-tone resist in ion beam lithography'. Together they form a unique fingerprint.

Material Science

Engineering