Atomically Controlled Processing for Future Si-Based Devices

Junichi Murota, Masao Sakuraba, Bernd Tillack

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

Original languageEnglish
Title of host publicationFuture Trends in Microelectronics
Subtitle of host publicationUp the Nano Creek
PublisherJohn Wiley & Sons, Inc.
Number of pages13
ISBN (Print)9780470081464
Publication statusPublished - 2007 Jan 22


  • Automatically controlled processing
  • Chemical vapor deposition
  • CVD processing
  • Depth dependence
  • Low temperature processing

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