Autocatalytic water dissociation on Cu(110) at near ambient conditions

Klas Andersson, Guido Ketteler, Hendrik Bluhm, Susumu Yamamoto, Hirohito Ogasawara, Lars G.M. Pettersson, Miquel Salmeron, Anders Nilsson

Research output: Contribution to journalArticlepeer-review

113 Citations (Scopus)


Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.

Original languageEnglish
Pages (from-to)2793-2797
Number of pages5
JournalJournal of the American Chemical Society
Issue number9
Publication statusPublished - 2008 Mar 5


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