Autocatalytic water dissociation on Cu(110) at near ambient conditions

Klas Andersson; Guido Ketteler; Hendrik Bluhm; Susumu Yamamoto; Hirohito Ogasawara; Lars G.M. Pettersson; Miquel Salmeron; Anders Nilsson

doi:10.1021/ja073727x

Autocatalytic water dissociation on Cu(110) at near ambient conditions

Klas Andersson, Guido Ketteler, Hendrik Bluhm, Susumu Yamamoto, Hirohito Ogasawara, Lars G.M. Pettersson, Miquel Salmeron, Anders Nilsson

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Abstract

Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H₂O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.

Original language	English
Pages (from-to)	2793-2797
Number of pages	5
Journal	Journal of the American Chemical Society
Volume	130
Issue number	9
DOIs	https://doi.org/10.1021/ja073727x
Publication status	Published - 2008 Mar 5

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abstract = "Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Br{\o}nsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.",

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T1 - Autocatalytic water dissociation on Cu(110) at near ambient conditions

AU - Andersson, Klas

AU - Ketteler, Guido

AU - Bluhm, Hendrik

AU - Yamamoto, Susumu

AU - Ogasawara, Hirohito

AU - Pettersson, Lars G.M.

AU - Salmeron, Miquel

AU - Nilsson, Anders

PY - 2008/3/5

Y1 - 2008/3/5

N2 - Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.

AB - Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.

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Autocatalytic water dissociation on Cu(110) at near ambient conditions

Abstract

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