Band bending measurement of HfO 2 /SiO 2 /Si capacitor with ultra-thin La 2 O 3 insertion by XPS

K. Kakushima, K. Okamoto, M. Adachi, K. Tachi, J. Song, S. Sato, T. Kawanago, P. Ahmet, K. Tsutsui, N. Sugii, T. Hattori, H. Iwai

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

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Chemistry