Behavior of Silicon Electrodepositing in Fluoride Molten Salts

Xin Wang; Shuqiang Jiao; Hongmin Zhu

doi:10.1002/9781118371350.ch13

Behavior of Silicon Electrodepositing in Fluoride Molten Salts

Xin Wang, Shuqiang Jiao, Hongmin Zhu

Research output: Chapter in Book/Report/Conference proceeding › Chapter

Original language	English
Title of host publication	Electrometallurgy 2012
Publisher	John Wiley and Sons
Pages	119-124
Number of pages	6
ISBN (Print)	9781118291177
DOIs	https://doi.org/10.1002/9781118371350.ch13
Publication status	Published - 2012 May 15
Externally published	Yes

Keywords

Electrochemical deposition
Fluoride melts
Silicon

ASJC Scopus subject areas

Materials Science(all)

Access to Document

10.1002/9781118371350.ch13

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title = "Behavior of Silicon Electrodepositing in Fluoride Molten Salts",

keywords = "Electrochemical deposition, Fluoride melts, Silicon",

author = "Xin Wang and Shuqiang Jiao and Hongmin Zhu",

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T1 - Behavior of Silicon Electrodepositing in Fluoride Molten Salts

AU - Wang, Xin

AU - Jiao, Shuqiang

AU - Zhu, Hongmin

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Y1 - 2012/5/15

KW - Electrochemical deposition

KW - Fluoride melts

KW - Silicon

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SP - 119

EP - 124

BT - Electrometallurgy 2012

PB - John Wiley and Sons

ER -

Behavior of Silicon Electrodepositing in Fluoride Molten Salts

Keywords

ASJC Scopus subject areas

Access to Document

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