Biexciton relaxation associated with dissociation into a surface polariton pair in semiconductor films

Yasuyoshi Mitsumori, Shimpei Matsuura, Shoichi Uchiyama, Kentarao Saito, Keiichi Edamatsu, Masaaki Nakayama, Hiroshi Ajiki

Research output: Contribution to journalArticlepeer-review

Abstract

We study the biexciton relaxation process in CuCl films ranging from 6 to 200 nm. The relaxation time is measured as the dephasing time and the lifetime. We observe a unique thickness dependence of the biexciton relaxation time and also obtain an ultrafast relaxation time with a timescale as short as 100 fs, while the exciton lifetime monotonically decreases with increasing thickness. By analyzing the exciton-photon coupling energy for a surface polariton, we theoretically calculate the biexciton relaxation time as a function of the thickness. The calculated dependence qualitatively reproduces the observed relaxation time, indicating that the biexciton dissociation into a surface polariton pair is one of the major biexciton relaxation processes.

Original languageEnglish
Article number155303
JournalPhysical Review B
Volume97
Issue number15
DOIs
Publication statusPublished - 2018 Apr 12

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