Abstract
Recent progresses in nanometer-scale molecular self-organization and mesoscopic pattern formation are reviewed from the view point of nanotechnology of bottom-up materials fabrication. Nanometer-scale layer-by-layer self-assemblies on nanoparticles will provide wide applications in many fields. The micro-contact printing technique is effectively used for up-sizing the nanostructured molecular assemblies as submicrometer- and micrometer-scale patterns. Dissipative structures formed in non-equilibrium systems as self-organized spatio-temporal structures are newly employed for the mesoscopic patterning of the nanostructured molecular assemblies.
Original language | English |
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Pages (from-to) | 11-16 |
Number of pages | 6 |
Journal | Current Opinion in Colloid and Interface Science |
Volume | 6 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2001 Apr 3 |
Keywords
- Dissipative structure
- Mesoscopic patterning
- Molecular self-assembly
- Nano-technology
- Self-organization
ASJC Scopus subject areas
- Surfaces and Interfaces
- Physical and Theoretical Chemistry
- Polymers and Plastics
- Colloid and Surface Chemistry