Capacitive AFM Probe for High Speed Imaging

Yuji Shiba, Takahito Ono, Kazuyuki Minami, Masayoshi Esashi

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


A capacitive AFM probe having capacitive structure was fabricated by micromachining techniques. For obtaining a high sensitivity and a low voltage-actuation, the thin micro sensor consists of a single crystalline-silicon with a narrow gap between micro-cantilever and opposite electrode was fabricated. The gap is 1μm, the thickness of the cantilever is 0.5μm, and the size is 80×100 μm. As a result of evaluation of the performance, the micro-probe showed a sufficient performance for nanometric sensing. The capacitive AFM probe has a both functions for sensing and actuation, because the deflection of the micro-cantilever can be measured from the capacitance, and the micro-cantilever can be electrostatically actuated. By reducing the cantilever size, the operation with a high speed imaging is expected.

Original languageEnglish
Pages (from-to)647-651
Number of pages5
JournalIEEJ Transactions on Sensors and Micromachines
Issue number12
Publication statusPublished - 1998


  • capacitive AFM probe
  • high speed imaging
  • micromachining
  • narrow gap


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