Characterization of LiNb                         1-x                         Ta                         x                         O                         3                          composition-spread thin film by the scanning microwave microscope

Noriaki Okazaki; Sohei Okazaki; Hiroko Higuma; Shoji Miyashita; Yasuo Cho; Jun Nishimura; Tomoteru Fukumura; Masashi Kawasaki; Makoto Murakami; Yukio Yamamoto; Yuji Matsumoto; Hideomi Koinuma; Tetsuya Hasegawa

doi:10.1016/S0169-4332(03)00916-4

Characterization of LiNb _1-x Ta _x O ₃ composition-spread thin film by the scanning microwave microscope

Noriaki Okazaki, Sohei Okazaki, Hiroko Higuma, Shoji Miyashita, Yasuo Cho, Jun Nishimura, Tomoteru Fukumura, Masashi Kawasaki, Makoto Murakami, Yukio Yamamoto, Yuji Matsumoto, Hideomi Koinuma, Tetsuya Hasegawa

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Dielectric property of a composition-spread LiNb _1-x Ta _x O ₃ thin film, fabricated by the combinatorial pulsed-laser deposition (PLD) method, was systematically characterized by the scanning microwave microscope (SμM). Measured frequency shift showed a broad maximum around x = 0.2-0.5, and gradually decreased with x, resulting in a lower dielectric constant in the LiTaO ₃ side compared to the LiNbO ₃ side. The trend of frequency shift has been revealed to possess a strong correlation with the sharpness of XRD peak, suggesting that lowering of dielectric constant is principally brought about by the degradation of crystallinity.

Original language	English
Pages (from-to)	196-199
Number of pages	4
Journal	Applied Surface Science
Volume	223
Issue number	1-3
DOIs	https://doi.org/10.1016/S0169-4332(03)00916-4
Publication status	Published - 2004 Feb 15

Keywords

Composition-spread thin film
Concurrent X-ray diffraction
Dielectric constant
High-throughput characterization
Lithium niobate
Lithium tantalate
Pulsed-laser deposition (PLD)
Scanning microwave microscope (SμM)

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10.1016/S0169-4332(03)00916-4

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Okazaki, N., Okazaki, S., Higuma, H., Miyashita, S., Cho, Y., Nishimura, J., Fukumura, T., Kawasaki, M., Murakami, M., Yamamoto, Y., Matsumoto, Y., Koinuma, H., & Hasegawa, T. (2004). Characterization of LiNb _1-x Ta _x O ₃ composition-spread thin film by the scanning microwave microscope Applied Surface Science, 223(1-3), 196-199. https://doi.org/10.1016/S0169-4332(03)00916-4

Okazaki, Noriaki ; Okazaki, Sohei ; Higuma, Hiroko et al. / Characterization of LiNb _1-x Ta _x O ₃ composition-spread thin film by the scanning microwave microscope In: Applied Surface Science. 2004 ; Vol. 223, No. 1-3. pp. 196-199.

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title = " Characterization of LiNb 1-x Ta x O 3 composition-spread thin film by the scanning microwave microscope ",

abstract = " Dielectric property of a composition-spread LiNb 1-x Ta x O 3 thin film, fabricated by the combinatorial pulsed-laser deposition (PLD) method, was systematically characterized by the scanning microwave microscope (SμM). Measured frequency shift showed a broad maximum around x = 0.2-0.5, and gradually decreased with x, resulting in a lower dielectric constant in the LiTaO 3 side compared to the LiNbO 3 side. The trend of frequency shift has been revealed to possess a strong correlation with the sharpness of XRD peak, suggesting that lowering of dielectric constant is principally brought about by the degradation of crystallinity.",

keywords = "Composition-spread thin film, Concurrent X-ray diffraction, Dielectric constant, High-throughput characterization, Lithium niobate, Lithium tantalate, Pulsed-laser deposition (PLD), Scanning microwave microscope (SμM)",

author = "Noriaki Okazaki and Sohei Okazaki and Hiroko Higuma and Shoji Miyashita and Yasuo Cho and Jun Nishimura and Tomoteru Fukumura and Masashi Kawasaki and Makoto Murakami and Yukio Yamamoto and Yuji Matsumoto and Hideomi Koinuma and Tetsuya Hasegawa",

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doi = "10.1016/S0169-4332(03)00916-4",

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Okazaki, N, Okazaki, S, Higuma, H, Miyashita, S, Cho, Y, Nishimura, J, Fukumura, T, Kawasaki, M, Murakami, M, Yamamoto, Y, Matsumoto, Y, Koinuma, H & Hasegawa, T 2004, ' Characterization of LiNb _1-x Ta _x O ₃ composition-spread thin film by the scanning microwave microscope ', Applied Surface Science, vol. 223, no. 1-3, pp. 196-199. https://doi.org/10.1016/S0169-4332(03)00916-4

Characterization of LiNb _1-x Ta _x O ₃ composition-spread thin film by the scanning microwave microscope . / Okazaki, Noriaki; Okazaki, Sohei; Higuma, Hiroko et al.
In: Applied Surface Science, Vol. 223, No. 1-3, 15.02.2004, p. 196-199.

Research output: Contribution to journal › Article › peer-review

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T1 - Characterization of LiNb 1-x Ta x O 3 composition-spread thin film by the scanning microwave microscope

AU - Okazaki, Noriaki

AU - Okazaki, Sohei

AU - Higuma, Hiroko

AU - Miyashita, Shoji

AU - Cho, Yasuo

AU - Nishimura, Jun

AU - Fukumura, Tomoteru

AU - Kawasaki, Masashi

AU - Murakami, Makoto

AU - Yamamoto, Yukio

AU - Matsumoto, Yuji

AU - Koinuma, Hideomi

AU - Hasegawa, Tetsuya

PY - 2004/2/15

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N2 - Dielectric property of a composition-spread LiNb 1-x Ta x O 3 thin film, fabricated by the combinatorial pulsed-laser deposition (PLD) method, was systematically characterized by the scanning microwave microscope (SμM). Measured frequency shift showed a broad maximum around x = 0.2-0.5, and gradually decreased with x, resulting in a lower dielectric constant in the LiTaO 3 side compared to the LiNbO 3 side. The trend of frequency shift has been revealed to possess a strong correlation with the sharpness of XRD peak, suggesting that lowering of dielectric constant is principally brought about by the degradation of crystallinity.

AB - Dielectric property of a composition-spread LiNb 1-x Ta x O 3 thin film, fabricated by the combinatorial pulsed-laser deposition (PLD) method, was systematically characterized by the scanning microwave microscope (SμM). Measured frequency shift showed a broad maximum around x = 0.2-0.5, and gradually decreased with x, resulting in a lower dielectric constant in the LiTaO 3 side compared to the LiNbO 3 side. The trend of frequency shift has been revealed to possess a strong correlation with the sharpness of XRD peak, suggesting that lowering of dielectric constant is principally brought about by the degradation of crystallinity.

KW - Composition-spread thin film

KW - Concurrent X-ray diffraction

KW - Dielectric constant

KW - High-throughput characterization

KW - Lithium niobate

KW - Lithium tantalate

KW - Pulsed-laser deposition (PLD)

KW - Scanning microwave microscope (SμM)

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JF - Applied Surface Science

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Okazaki N, Okazaki S, Higuma H, Miyashita S, Cho Y, Nishimura J et al. Characterization of LiNb _1-x Ta _x O ₃ composition-spread thin film by the scanning microwave microscope Applied Surface Science. 2004 Feb 15;223(1-3):196-199. doi: 10.1016/S0169-4332(03)00916-4

Characterization of LiNb _1-x Ta _x O ₃ composition-spread thin film by the scanning microwave microscope

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