Characterization of oxide films on wrought Co–Cr–Mo–xSi alloys exposed to high-temperature oxidation

Phacharaphon Tunthawiroon, Mettaya Kitiwan, Kasama Srirussamee, Yunping Li, Kenta Yamanaka, Akihiko Chiba

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


Co-based alloys are currently being used in a wide range of high temperature applications owing to their high resistance to oxidation and corrosion. However, their oxidation-induced degradation could still occur during the long-term exposure to high temperature. Thus, the continuous development of oxidation-resistant Co-based alloys is of crucial importance. In this research, the influence of Si addition on the oxidation behavior of Co–Cr–Mo–xSi alloys under the isothermal oxidation treatment at 700 °C in air was investigated. The Si concentration (x) was varied from 0.1 to 5.0 wt.%. Surface morphologies and chemical compositions of the oxide films formed were analyzed by using SEM-EDS and XPS. The chemical compositions obtained from the surface analysis revealed that Si has played a role in the stabilization of Cr oxides on the surface of Co–Cr–Mo–xSi alloys. With increasing Si concentration, Co-oxide formation on the alloy surface was suppressed by the presence of Cr-oxide due to the selective oxidation of Cr atoms. Furthermore, SiO2 was both found along the grain boundaries and interfaces between the outmost oxide layer and matrix. It was also found that the oxide thickness was reduced with increasing Si concentration. This was a result of the formation of stable Cr-oxide and SiO2 sub-layer that became a barrier inhibiting the inward and outward diffusion of O and Cr.

Original languageEnglish
Article number109753
JournalCorrosion Science
Publication statusPublished - 2021 Oct


  • Co-based alloys
  • Co–Cr–Mo alloys
  • CrO
  • Oxidation behavior
  • SiO
  • XPS analysis


Dive into the research topics of 'Characterization of oxide films on wrought Co–Cr–Mo–xSi alloys exposed to high-temperature oxidation'. Together they form a unique fingerprint.

Cite this