Characterization of planar-diode bias-treatment in DC-plasma hetero-epitaxial diamond growth on Ir(001)

T. Aoyama, N. Amano, T. Goto, T. Abukawa, S. Kono, Y. Ando, A. Sawabe

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)


The effect of bias-treatment (BT) on Ir(001)/MgO(001) substrates in a newly invented planar-diode DC-plasma system has been characterized in-situ and ex-situ by X-ray photoelectron diffraction (XPD), XPS, LEED and SEM. Features of XPD patterns of C 1s core levels were in good agreement with those of three-electrode BT [Diamond Relat. Mater. 13 (2004) 2081], although the degrees of anisotropy of C 1s XPD were smaller. Thicknesses of carbon films estimated from intensity ratios of C 1s/Ir 4d5/2 (or 4f) XPS peaks were about 2 times larger than those of three-electrode BT. LEED patterns showed no diffraction spots after BT. As a result, we conclude that epitaxial diamond crystallites with the size of a few nm or so are embedded in a non-oriented carbon layer. In the cases where no finite anisotropy of C 1s XPD was observed, no epitaxial diamond grains were grown in post-CVD as revealed by ex-situ SEM. Thus, it is concluded that the anisotropy of C 1s XPD can be a useful measure of diamond nucleation by BT on Ir(001) substrates.

Original languageEnglish
Pages (from-to)594-599
Number of pages6
JournalDiamond and Related Materials
Issue number3
Publication statusPublished - 2007 Mar


  • CVD hetero-epitaxial diamond
  • Diamond growth and characterization
  • Ir(001) substrate
  • X-ray photoelectron diffraction


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