Characterization of submicron-scale periodic grooves by grazing incidence ultra-small-angle X-ray scattering

Yoshiyasu Ito; Katsuhiko Inaba; Kazuhiko Omote; Yasuo Wada; Susumu Ikeda

doi:10.1143/JJAP.46.L773

Characterization of submicron-scale periodic grooves by grazing incidence ultra-small-angle X-ray scattering

Yoshiyasu Ito, Katsuhiko Inaba, Kazuhiko Omote, Yasuo Wada, Susumu Ikeda

Advanced Institute for Materials Research (AIMR)

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

A grazing incidence ultra-small-angle X-ray scattering measurement system using a laboratory X-ray source has been developed. Submicron-scale artificial periodic grooves on thermally oxidized silicon wafers are characterized using this system. They are fabricated by electron beam lithography. The average pitch widths of the grooves are determined accurately with a low standard uncertainty of less than 0.02%. The cross-sectional profiles are also analyzed by intensity ratios of higher-order diffraction peaks from the periodic structures and X-ray reflectivity measurements. The obtained cross-sectional profiles are in good agreement with those obtained by atomic force microscopy.

Original language	English
Pages (from-to)	L773-L775
Journal	Japanese Journal of Applied Physics
Volume	46
Issue number	29-32
DOIs	https://doi.org/10.1143/JJAP.46.L773
Publication status	Published - 2007 Aug 10

Keywords

Critical dimension
Electron beam lithography
Graphoepitaxlal growth
Grazing incidence
Periodic groove
Small-angle X-ray scattering

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10.1143/JJAP.46.L773

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title = "Characterization of submicron-scale periodic grooves by grazing incidence ultra-small-angle X-ray scattering",

abstract = "A grazing incidence ultra-small-angle X-ray scattering measurement system using a laboratory X-ray source has been developed. Submicron-scale artificial periodic grooves on thermally oxidized silicon wafers are characterized using this system. They are fabricated by electron beam lithography. The average pitch widths of the grooves are determined accurately with a low standard uncertainty of less than 0.02%. The cross-sectional profiles are also analyzed by intensity ratios of higher-order diffraction peaks from the periodic structures and X-ray reflectivity measurements. The obtained cross-sectional profiles are in good agreement with those obtained by atomic force microscopy.",

keywords = "Critical dimension, Electron beam lithography, Graphoepitaxlal growth, Grazing incidence, Periodic groove, Small-angle X-ray scattering",

author = "Yoshiyasu Ito and Katsuhiko Inaba and Kazuhiko Omote and Yasuo Wada and Susumu Ikeda",

note = "Funding Information: Funding has been provided by the Water Resources Research Institute, grant number A&%-ALA and by the Environmental Protection Agency, grant number R-804748010. We are very thankful for both contributions. Thanks are also due to J. Montgomery, Tuscaloosa Water Works, for providing samples.",

year = "2007",

month = aug,

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doi = "10.1143/JJAP.46.L773",

language = "English",

volume = "46",

pages = "L773--L775",

journal = "Japanese Journal of Applied Physics",

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publisher = "Japan Society of Applied Physics",

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T1 - Characterization of submicron-scale periodic grooves by grazing incidence ultra-small-angle X-ray scattering

AU - Ito, Yoshiyasu

AU - Inaba, Katsuhiko

AU - Omote, Kazuhiko

AU - Wada, Yasuo

AU - Ikeda, Susumu

N1 - Funding Information: Funding has been provided by the Water Resources Research Institute, grant number A&%-ALA and by the Environmental Protection Agency, grant number R-804748010. We are very thankful for both contributions. Thanks are also due to J. Montgomery, Tuscaloosa Water Works, for providing samples.

PY - 2007/8/10

Y1 - 2007/8/10

N2 - A grazing incidence ultra-small-angle X-ray scattering measurement system using a laboratory X-ray source has been developed. Submicron-scale artificial periodic grooves on thermally oxidized silicon wafers are characterized using this system. They are fabricated by electron beam lithography. The average pitch widths of the grooves are determined accurately with a low standard uncertainty of less than 0.02%. The cross-sectional profiles are also analyzed by intensity ratios of higher-order diffraction peaks from the periodic structures and X-ray reflectivity measurements. The obtained cross-sectional profiles are in good agreement with those obtained by atomic force microscopy.

AB - A grazing incidence ultra-small-angle X-ray scattering measurement system using a laboratory X-ray source has been developed. Submicron-scale artificial periodic grooves on thermally oxidized silicon wafers are characterized using this system. They are fabricated by electron beam lithography. The average pitch widths of the grooves are determined accurately with a low standard uncertainty of less than 0.02%. The cross-sectional profiles are also analyzed by intensity ratios of higher-order diffraction peaks from the periodic structures and X-ray reflectivity measurements. The obtained cross-sectional profiles are in good agreement with those obtained by atomic force microscopy.

KW - Critical dimension

KW - Electron beam lithography

KW - Graphoepitaxlal growth

KW - Grazing incidence

KW - Periodic groove

KW - Small-angle X-ray scattering

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SP - L773-L775

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 29-32

ER -

Characterization of submicron-scale periodic grooves by grazing incidence ultra-small-angle X-ray scattering

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Keywords

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