TY - JOUR
T1 - Combinatorial fabrication and cathodoluminescence properties of composition spread MHfO 3 :Tm 3+ (M = Ca, Sr and Ba) films
AU - Arai, N.
AU - Kim, T. W.
AU - Kubota, H.
AU - Matsumoto, Y.
AU - Koinuma, H.
N1 - Funding Information:
This work was supported in part by CREST-JST and COMET-STA projects. The authors thank Mitsubishi Chemical Corporation and Phosphor R&D Department, Kasei Optonix Ltd. for the measurements of the CL property.
PY - 2002
Y1 - 2002
N2 - A series of MHfO 3 :Tm 3+ (M = Ca, Sr and Ba) films were fabricated on SrTiO 3 (0 0 1) substrate by using combinatorial pulsed laser deposition (PLD) technique. Their crystal structures and luminescence properties were characterized by the concurrent X-ray diffraction (CXRD) and by the cathodoluminescence (CL) using 5 kV electron beam, respectively. By monitoring the reflection high energy electron diffraction (RHEED) intensity oscillation, the growth of MHfO 3 :Tm 3+ films were optimized to proceed in a epitaxial layer-by-layer fashion. Different from bulk powders, which had the highest CL intensity in SrHfO 3 :Tm 3+ , the composition spread film of Sr 1-x Ca x HfO 3 :Tm 3+ (x = 0-1) exhibited the highest CL intensity at x = 0.7 rather than SrHfO 3 :Tm 3+ (x=0). This anomalous behavior in the films is discussed in view of the stress effect from the substrate.
AB - A series of MHfO 3 :Tm 3+ (M = Ca, Sr and Ba) films were fabricated on SrTiO 3 (0 0 1) substrate by using combinatorial pulsed laser deposition (PLD) technique. Their crystal structures and luminescence properties were characterized by the concurrent X-ray diffraction (CXRD) and by the cathodoluminescence (CL) using 5 kV electron beam, respectively. By monitoring the reflection high energy electron diffraction (RHEED) intensity oscillation, the growth of MHfO 3 :Tm 3+ films were optimized to proceed in a epitaxial layer-by-layer fashion. Different from bulk powders, which had the highest CL intensity in SrHfO 3 :Tm 3+ , the composition spread film of Sr 1-x Ca x HfO 3 :Tm 3+ (x = 0-1) exhibited the highest CL intensity at x = 0.7 rather than SrHfO 3 :Tm 3+ (x=0). This anomalous behavior in the films is discussed in view of the stress effect from the substrate.
KW - Cathodoluminescence
KW - Combinatorial
KW - Epitaxial film
KW - Phosphor
KW - Pulsed laser deposition
KW - Tm
UR - http://www.scopus.com/inward/record.url?scp=0036432874&partnerID=8YFLogxK
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U2 - 10.1016/S0169-4332(02)00349-5
DO - 10.1016/S0169-4332(02)00349-5
M3 - Conference article
AN - SCOPUS:0036432874
SN - 0169-4332
VL - 197-198
SP - 402
EP - 405
JO - Applied Surface Science
JF - Applied Surface Science
T2 - Cola 2001
Y2 - 1 October 2001 through 1 October 2001
ER -