Construction of the experimental set-up for ultra slow muon generation by thermal Mu ionization method at RIKEN-RAL

Y. Miyake, K. Shimomura, Y. Matsuda, R. J. Scheuermann, P. Bakule, S. Makimura, P. Strasser, S. N. Nakamura, K. Ishida, T. Matsuzaki, I. Watanabe, K. Nagamine

Research output: Contribution to journalConference articlepeer-review

5 Citations (Scopus)


At KEK-MSL we have been pursuing the Ultra Slow Muon Project, in which thermal muonium atoms (designated as Mu; consisting of a μ+ and an e-) are generated from the surface of a hot tungsten foil, placed at the primary 500 MeV proton beam line and ionized by intense lasers synchronized with the emission of Mu. However, because of the high radiation in the primary proton beam line where the present set-up is installed, a slow muon generation started not from a primary proton beam but with much higher intense surface muons is seriously required, in order to understand slow muon generation more deeply and to obtain more intense slow muons. Therefore, we are planning to perform a slow muon generation using intense surface muons, taking the advantage of the intensity of the proton beam at ISIS of 200 μA being about 40 times as large as that of KEK-MSL. In this report, we are presenting a new set-up, a slow beam optics and a laser system operated at 25 Hz prepared for the generation of ultra slow muons at the RIKEN-RAL muon facility.

Original languageEnglish
Pages (from-to)666-669
Number of pages4
JournalPhysica B: Condensed Matter
Publication statusPublished - 2000 Aug
Externally publishedYes
Event8th International Conference on Muon Spin Rotation, Relaxation and Resonance (muSR'99) - Les Diablerets, Switz
Duration: 1999 Aug 301999 Sept 3

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


Dive into the research topics of 'Construction of the experimental set-up for ultra slow muon generation by thermal Mu ionization method at RIKEN-RAL'. Together they form a unique fingerprint.

Cite this