TY - JOUR
T1 - Control of surface potential and hydroxyapatite formation on TiO2 scales containing nitrogen-related defects
AU - Hashimoto, Masami
AU - Ogawa, Takafumi
AU - Kitaoka, Satoshi
AU - Muto, Shunsuke
AU - Furuya, Maiko
AU - Kanetaka, Hiroyasu
AU - Abe, Masayuki
AU - Yamashita, Hayato
N1 - Funding Information:
This work was supported in part by Grants-in-Aid for Scientific Research on Innovative Areas “Nano Informatics” (Nos. 25106008 and 25106004 ) and by a Kibankenkyu A grant (No. 26249096 ) and Kibankenkyu C grant (No. 16K06786 ) from the Japan Society for the Promotion of Science (JSPS) . A part of this work was supported by Nagoya University microstructural characterization platform as a program of “Nanotechnology Platform” of the Ministry of Education, Culture, Sports, Science and Technology (MEXT) , Japan.
Publisher Copyright:
© 2018 Acta Materialia Inc.
PY - 2018/8/15
Y1 - 2018/8/15
N2 - The hydroxyapatite (HAp) formation ability and related surface potentials of rutile-type TiO2 scales formed on Ti are controlled by varying the Ti heat treatment conditions in a N2 atmosphere containing a trace amount of O2. The zeta potentials of the samples heated at 873 and 973 K for 1 h are large negative and positive values, respectively, where HAp formation on the surface is enhanced in both cases. Upon longer heat treatment at those temperatures, the HAp forming ability diminishes and the zeta potential becomes more neutral. Kelvin probe force microscopy indicates that, under dry conditions, the surface charges on the TiO2 scales formed at 873 and 973 K in 1 h are positive and negative, respectively, opposite to the signs of the zeta potentials measured under wet conditions. Scanning transmission electron microscopy, electron energy loss spectroscopy, and calculations of defect formation energies reveal that nitrogen atoms incorporated into TiO2 during scale formation produce the charged defects (NO)O −1 and (N2)O +2 for the scales formed in 1 h at 873 and 973 K, respectively. In the case of longer treatments, nitrogen-related defects presumably transform into more stable states, such as N2 gas, in voids, resulting in a neutral surface. The present findings lead to physical models of surface charge distributions that elucidate the relationship between nitrogen-related defects, charged surfaces, and HAp formation mechanisms.
AB - The hydroxyapatite (HAp) formation ability and related surface potentials of rutile-type TiO2 scales formed on Ti are controlled by varying the Ti heat treatment conditions in a N2 atmosphere containing a trace amount of O2. The zeta potentials of the samples heated at 873 and 973 K for 1 h are large negative and positive values, respectively, where HAp formation on the surface is enhanced in both cases. Upon longer heat treatment at those temperatures, the HAp forming ability diminishes and the zeta potential becomes more neutral. Kelvin probe force microscopy indicates that, under dry conditions, the surface charges on the TiO2 scales formed at 873 and 973 K in 1 h are positive and negative, respectively, opposite to the signs of the zeta potentials measured under wet conditions. Scanning transmission electron microscopy, electron energy loss spectroscopy, and calculations of defect formation energies reveal that nitrogen atoms incorporated into TiO2 during scale formation produce the charged defects (NO)O −1 and (N2)O +2 for the scales formed in 1 h at 873 and 973 K, respectively. In the case of longer treatments, nitrogen-related defects presumably transform into more stable states, such as N2 gas, in voids, resulting in a neutral surface. The present findings lead to physical models of surface charge distributions that elucidate the relationship between nitrogen-related defects, charged surfaces, and HAp formation mechanisms.
KW - First-principle analysis
KW - Hydroxyapatite
KW - Nitrogen-related defect
KW - Surface potential
KW - TiO
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U2 - 10.1016/j.actamat.2018.05.072
DO - 10.1016/j.actamat.2018.05.072
M3 - Article
AN - SCOPUS:85048807294
SN - 1359-6454
VL - 155
SP - 379
EP - 385
JO - Acta Materialia
JF - Acta Materialia
ER -