Creating electron phase holograms using femtosecond laser interference processing

Yuuki Uesugi, Ryota Fukushima, Koh Saitoh, Shunichi Sato

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


Recently, electron beams with structured phase fronts, such as electron vortex beams, have attracted considerable interest. Herein, we present a novel method of fabricating electron phase holograms using a femtosecond laser interference processing. A 35-nm-thick silicon membrane, corresponding to a phase shift of π for 200-keV electrons, was processed using single-shot laser irradiation, whereas processing such thin membranes with a focused ion beam milling technique would be very difficult. This rapid and efficient technique is expected to produce phase diffraction elements for practical applications in a wide range of electron optics fields.

Original languageEnglish
Pages (from-to)20958-20964
Number of pages7
JournalOptics Express
Issue number15
Publication statusPublished - 2019 Jul 22


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