TY - GEN
T1 - Creating novel transport properties in electric double layer field effect transistors based on layered materials
AU - Ye, J. T.
AU - Craciun, M. F.
AU - Koshino, M.
AU - Russo, S.
AU - Kasahara, Y.
AU - Yuan, H. T.
AU - Shimotani, H.
AU - Morpurgo, A. F.
AU - Iwasa, Y.
N1 - Funding Information:
We thank D. Chiba, Y. Ohno, F. Matsukura, and H. Ohno for providing the electron beam lithography facility at Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University. MFC, SR, and AFM would like to thank S. Tarucha for support and for a collaboration during which this work has started. This research is funded by MEXT and JST. AFM gratefully acknowledges MaNEP and the Swiss National Science Foundation (project 200021_121569) for financial support.
PY - 2011
Y1 - 2011
N2 - We present a study on the liquid/solid interface, which can be electrostatically doped to a high carrier density (n-10 14 cm -2) by electric-double-layer gating. Using micro-cleavage technique on the layered materials: ZrNCl and graphene, atomically flat channel surfaces can be easily prepared. Intrinsic high carrier density transport regime is accessed at the channel interface of electric double-layer field effect transistor, where novel transport properties are unveiled as the field-induced superconductivity on the ZrNCl with high transition temperature at 15 K, and accessing a high carrier density up to 2×10 14 cm -2 in graphene and its multi-layers.
AB - We present a study on the liquid/solid interface, which can be electrostatically doped to a high carrier density (n-10 14 cm -2) by electric-double-layer gating. Using micro-cleavage technique on the layered materials: ZrNCl and graphene, atomically flat channel surfaces can be easily prepared. Intrinsic high carrier density transport regime is accessed at the channel interface of electric double-layer field effect transistor, where novel transport properties are unveiled as the field-induced superconductivity on the ZrNCl with high transition temperature at 15 K, and accessing a high carrier density up to 2×10 14 cm -2 in graphene and its multi-layers.
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U2 - 10.1557/opl.2011.289
DO - 10.1557/opl.2011.289
M3 - Conference contribution
AN - SCOPUS:84859067810
SN - 9781618395030
T3 - Materials Research Society Symposium Proceedings
SP - 103
EP - 108
BT - Novel Fabrication Methods for Electronic Devices
T2 - 2010 MRS Fall Meeting
Y2 - 29 November 2010 through 3 December 2010
ER -