Crystal growth and characterization of Mg2Si for IR-detectors and thermoelectric applications

Haruhiko Udono, Hiroyuki Tajima, Masahito Uchikoshi, Masaru Itakura

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We have investigated the melt growth of Mg2Si crystal and its electrical and optical properties. Progress in Mg source purity and stoichiometric control during the growth enabled the development of a high purity Mg2Si crystal with low carrier density and a high stable Mg2Si with good doping controllability. The Mg2Si crystal grown by the pressure controlled Bridgman method using 5N purity or 6N purity of Mg source and purified PG crucible showed low electron density (∼1015cm-3) and high electron mobility (485cm2V-1 s-1 at 300K and 21900 cm2V-1 s-1 at 40 K). Silver doping in the high purity crystals performed the low-hole density of p-type Mg2Si (∼3 × 1016cm-3). Ionization energy of residual Al donor in the high purity crystal and Ag acceptor in the Ag doped crystals was determined as 8-9meV and 26meV, respectively. Indirect band gap energy Eg of approximately 0.61 eV at 300K and 0.69 eV at 4K were estimated by the optical transmission measurements on the high purity crystals. It is also found that the Sb-doped melt grown crystal had good power factor around room temperature (26μWcm-1K-2 at 270 K).

Original languageEnglish
Article number07JB06
JournalJapanese Journal of Applied Physics
Issue number7
Publication statusPublished - 2015 Jul 1


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