Crystal growth of GaN by ammonothermal method

A. Yoshikawa, E. Ohshima, T. Fukuda, H. Tsuji, K. Oshima

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142 Citations (Scopus)


GaN crystal could be grown by ammonothermal method using NH4Cl mineralizer. Inner wall of autoclave is covered with Pt so as to prevent possible contamination from autoclave. Reaction was carried out with supercritical ammonia at temperatures of 500°C and pressures of 135 MPa. Recrystallization of GaN was also confirmed under the condition of 500°C and 120 MPa, which is the lowest reaction pressure ever reported for GaN growth by ammonothermal method. These results show the possibility for the real industrial volume production of GaN by ammonothermal method.

Original languageEnglish
Pages (from-to)67-72
Number of pages6
JournalJournal of Crystal Growth
Issue number1-2
Publication statusPublished - 2004 Jan 2


  • A2. Ammono-thermal method
  • Al. Supercritical
  • B1. Ammonia
  • B1. GaN


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