Crystalline nanoscale M203 (M = Gd, Nd) thin films grown by molecular beam epitaxy on Si(111)

Jinxing Wang, Tianmo Liu, Zhongchang Wang

    Research output: Contribution to journalArticlepeer-review

    3 Citations (Scopus)


    We report the growth, crystal structures, and orientation relationships of nanoscale M2O3 (M = Gd, Nd) thin films on Si(111) substrates using molecular beam epitaxy. We find that the grown Gd 203 and Nd2O3 layers share the cubic bixbyite structure, have single orientations, and are well crystallized. The epitaxial oxides are also found to be of threefold symmetry, having orientation relationships [111]m2O3 // [ 111 ]si and [11̄0]M 2O3 // [lmacr;10]si with respect to the Si substrates. Further investigations along in-plane direction show that theM 2O3 layers are well matched to the double unit cell of Si substrates, with slightly negative mismatch for the Gd2O3 and positive for the Nd2O3.

    Original languageEnglish
    Pages (from-to)2115-2117
    Number of pages3
    JournalMaterials Transactions
    Issue number8
    Publication statusPublished - 2009 Aug


    • Crystal structure
    • GdOndO
    • Molecular beam epitaxy

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanical Engineering
    • Mechanics of Materials


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