Crystallization behavior of co-sputtered amorphous Ti-C and Co-C thin films

Toyohiko J. Konno; Koichi Bandoh

doi:10.4028/www.scientific.net/JMNM.24-25.57

Crystallization behavior of co-sputtered amorphous Ti-C and Co-C thin films

Toyohiko J. Konno, Koichi Bandoh

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

We have prepared Ti_1-xC_x (x=0.5-0.9) thin films by co-sputtering, and investigated their crystallization behavior by in-situ transmission electron microscopy. Only Ti_0.1C_0.9 exhibited a single phase amorphous state; while films with other compositions were found to be a mixture of the fee TiC phase and a carbon-based amorphous phase. Annealing of the Ti_0.1C_0.9 film at 400°C brought about the precipitation of the TiC particles of 30-40 nm within the amorphous carbon matrix. Upon further annealing at 500°C, these particles were found to grow abnormally, exhibiting rod-like morphology of about μm in length with [110] preferred orientation. The activation energy for growth was about 4.0eV. These findings were compared with the behavior of Co-C films; similarities were discussed from thermodynamical and kinetic points of view.

Original language	English
Pages (from-to)	57-60
Number of pages	4
Journal	Journal of Metastable and Nanocrystalline Materials
Volume	24-25
DOIs	https://doi.org/10.4028/www.scientific.net/JMNM.24-25.57
Publication status	Published - 2005
Externally published	Yes

Keywords

Amorphous alloy
Crystallization
Metal carbides
Transmission electron microscopy

ASJC Scopus subject areas

Materials Science (miscellaneous)
Materials Science(all)
Condensed Matter Physics
Physical and Theoretical Chemistry

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Cite this

@article{a15867f6a14448da95a49e99c633b236,

title = "Crystallization behavior of co-sputtered amorphous Ti-C and Co-C thin films",

abstract = "We have prepared Ti1-xCx (x=0.5-0.9) thin films by co-sputtering, and investigated their crystallization behavior by in-situ transmission electron microscopy. Only Ti0.1C0.9 exhibited a single phase amorphous state; while films with other compositions were found to be a mixture of the fee TiC phase and a carbon-based amorphous phase. Annealing of the Ti0.1C0.9 film at 400°C brought about the precipitation of the TiC particles of 30-40 nm within the amorphous carbon matrix. Upon further annealing at 500°C, these particles were found to grow abnormally, exhibiting rod-like morphology of about μm in length with [110] preferred orientation. The activation energy for growth was about 4.0eV. These findings were compared with the behavior of Co-C films; similarities were discussed from thermodynamical and kinetic points of view.",

keywords = "Amorphous alloy, Crystallization, Metal carbides, Transmission electron microscopy",

author = "Konno, {Toyohiko J.} and Koichi Bandoh",

year = "2005",

doi = "10.4028/www.scientific.net/JMNM.24-25.57",

language = "English",

volume = "24-25",

pages = "57--60",

journal = "Journal of Metastable and Nanocrystalline Materials",

issn = "1422-6375",

publisher = "Trans Tech Publications",

}

TY - JOUR

T1 - Crystallization behavior of co-sputtered amorphous Ti-C and Co-C thin films

AU - Konno, Toyohiko J.

AU - Bandoh, Koichi

PY - 2005

Y1 - 2005

N2 - We have prepared Ti1-xCx (x=0.5-0.9) thin films by co-sputtering, and investigated their crystallization behavior by in-situ transmission electron microscopy. Only Ti0.1C0.9 exhibited a single phase amorphous state; while films with other compositions were found to be a mixture of the fee TiC phase and a carbon-based amorphous phase. Annealing of the Ti0.1C0.9 film at 400°C brought about the precipitation of the TiC particles of 30-40 nm within the amorphous carbon matrix. Upon further annealing at 500°C, these particles were found to grow abnormally, exhibiting rod-like morphology of about μm in length with [110] preferred orientation. The activation energy for growth was about 4.0eV. These findings were compared with the behavior of Co-C films; similarities were discussed from thermodynamical and kinetic points of view.

AB - We have prepared Ti1-xCx (x=0.5-0.9) thin films by co-sputtering, and investigated their crystallization behavior by in-situ transmission electron microscopy. Only Ti0.1C0.9 exhibited a single phase amorphous state; while films with other compositions were found to be a mixture of the fee TiC phase and a carbon-based amorphous phase. Annealing of the Ti0.1C0.9 film at 400°C brought about the precipitation of the TiC particles of 30-40 nm within the amorphous carbon matrix. Upon further annealing at 500°C, these particles were found to grow abnormally, exhibiting rod-like morphology of about μm in length with [110] preferred orientation. The activation energy for growth was about 4.0eV. These findings were compared with the behavior of Co-C films; similarities were discussed from thermodynamical and kinetic points of view.

KW - Amorphous alloy

KW - Crystallization

KW - Metal carbides

KW - Transmission electron microscopy

UR - http://www.scopus.com/inward/record.url?scp=63849264455&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=63849264455&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/JMNM.24-25.57

DO - 10.4028/www.scientific.net/JMNM.24-25.57

M3 - Article

AN - SCOPUS:63849264455

SN - 1422-6375

VL - 24-25

SP - 57

EP - 60

JO - Journal of Metastable and Nanocrystalline Materials

JF - Journal of Metastable and Nanocrystalline Materials

ER -

Crystallization behavior of co-sputtered amorphous Ti-C and Co-C thin films

Abstract

Keywords

ASJC Scopus subject areas

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