Damage-free LED lithography for atomically thin 2D material devices

Yue Shi, Takaaki Taniguchi, Ki Nam Byun, Daiki Kurimoto, Eisuke Yamamoto, Makoto Kobayashi, Kazuhito Tsukagoshi, Minoru Osada

Research output: Contribution to journalArticlepeer-review


Desired electrode patterning on two-dimensional (2D) materials is a foremost step for realizing the full potentials of 2D materials in electronic devices. Here, we introduce an approach for damage-free, on-demand manufacturing of 2D material devices using light-emitting diode (LED) lithography. The advantage of this method lies in mild photolithography by simply combining an ordinary optical microscope with a commercially available LED projector; the low-energy red component is utilized for optical characterization and alignment of devices, whereas the high-energy blue component is utilized for photoresist exposure and development of personal computer designed electrode patterns. This method offers maskless, damage-free photolithography, which is particularly suitable for 2D materials that are sensitive to conventional lithography. We applied this LED lithography to device fabrication of selected nanosheets (MoS2, graphene oxides and RuO2), and achieved damage-free lithography of various patterned electrodes with feature sizes as small as 1–2 μm. The LED lithography offers a useful approach for cost-effective mild lithography without any costly instruments, high vacuum, or complex operation.

Original languageEnglish
Article number2583
JournalScientific reports
Issue number1
Publication statusPublished - 2023 Dec

ASJC Scopus subject areas

  • General


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