Damage-free post-CMP cleaning solution for low-k fluorocarbon on advanced interconnects

Xun Gu, Takenao Nemoto, Akinobu Teramoto, Rui Hasebe, Takashi Ito, Tadahiro Ohmi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

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Material Science

Engineering