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Defect-free etching process for GaAs/AlGaAs hetero-nanostructure using chlorine/argon mixed neutral beam
Xuan Yu Wang, Chi Hsien Huang, Yuzo Ohno, Mokoto Igarashi, Akihiro Murayama, Seiji Samukawa
Research output: Contribution to journal › Article › peer-review
17
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(Scopus)