Deformation of varifocal mirror with narrow frame by SOI wafer residual stress

Takashi Sasaki, Kazuhiro Hane

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8 mrad which was explained by the calculated value of 3.9 mrad. The mirror was deflected by 100 nm with the top-flat shape, which also agreed well with the proposed analysis.

Original languageEnglish
Pages (from-to)26-33
Number of pages8
JournalElectronics and Communications in Japan
Issue number8
Publication statusPublished - 2012 Aug


  • mirror support frame
  • silicon-on-insulator (SOI) wafer
  • surface profile
  • varifocal mirror


Dive into the research topics of 'Deformation of varifocal mirror with narrow frame by SOI wafer residual stress'. Together they form a unique fingerprint.

Cite this