Deformation of varifocal mirror with narrow frame by SOI wafer residual stress

Takashi Sasaki, Kazuhiro Hane

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8mrad which was explained by the calculated value of 3.9mrad. The mirror was deflected by 100nm with the top-flat shape, which also agreed well with the proposed analysis.

Original languageEnglish
Pages (from-to)310-315
Number of pages6
JournalIEEJ Transactions on Sensors and Micromachines
Issue number8
Publication statusPublished - 2011


  • Mirror supporting frame
  • SOI wafer
  • Surface profile
  • Varifocal mirror


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