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Degree of Cl
2
dissociation and etching characteristics in high-density plasmas
Seiji Samukawa
Research output
:
Contribution to journal
›
Article
›
peer-review
11
Citations (Scopus)
Overview
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Dive into the research topics of 'Degree of Cl
2
dissociation and etching characteristics in high-density plasmas'. Together they form a unique fingerprint.
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Physics
Etching
100%
Plasma Frequencies
57%
Electron Density
14%
Electron Energy
14%
Surface Reaction
14%
Dissociation
14%
Energy Distribution
14%
Plasma Density
14%
Distribution Function
14%
Differences
14%
Gases
14%
Low Pressure
14%
Chemistry
Etching
100%
Doping Material
28%
Degree of Dissociation
28%
Rate
28%
Electron Density
14%
Surface Reaction
14%
Dissociation
14%
Gas
14%
Distribution Function
14%
Chemical Reaction
14%
Density
14%
Material Science
Etching
100%
Doping (Additives)
28%
Carrier Concentration
14%
Gas
14%
Plasma Density
14%
Psychology
Electron Density
14%